SCHEMBL25960296

SCHEMBL25960296

CCC(C)(C)OC(=O)N(C)C[SiH3]

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960284 0.82
SCHEMBL25960260 0.81 HDAC6 (0.38)
SCHEMBL25969292 0.80 CYP1A2 (0.33) ALDH1A1TSHRTDP1
SCHEMBL15195535 0.79 CHRNB2 (0.37) ALDH1A1TSHRTDP1
SCHEMBL25960297 0.78 MEN1 (0.33) ALDH1A1TSHRTDP1
SCHEMBL12411113 0.76 ALDH1A1 (0.38) ALDH1A1TSHRTDP1
SCHEMBL25960294 0.76 CA12 (0.35) ALDH1A1TSHR
SCHEMBL15083678 0.74 EPHX2 (0.39)
SCHEMBL25960295 0.73 CA12 (0.39) ALDH1A1
SCHEMBL13564184 0.70 ALDH1A1 (0.36) ALDH1A1TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed