Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FKBP1A | P62942 | 14/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25960309 | 0.89 | FKBP1A (0.52) | FKBP1A | |
| SCHEMBL25960270 | 0.88 | HSD17B10 (0.53) | FKBP1AHSD17B10RAB9AMEN1KMT2A | |
| SCHEMBL12769056 | 0.82 | RAB9A (0.55) | HSD17B10RAB9ASMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL9893422 | 0.82 | RAB9A (0.55) | HSD17B10RAB9ASMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL440340 | 0.78 | FKBP1A (0.58) | FKBP1AHSD17B10MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL8223617 | 0.78 | FKBP1A (0.58) | FKBP1AHSD17B10MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL1401256 | 0.78 | FKBP1A (0.58) | FKBP1AHSD17B10MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL12768307 | 0.77 | NPC1 (0.52) | FKBP1AMEN1KMT2AALDH1A1 | |
| SCHEMBL12873027 | 0.77 | FKBP1A (0.66) | FKBP1A | |
| SCHEMBL25960272 | 0.76 | FKBP1A (0.50) | FKBP1AHSD17B10MEN1KMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |