SCHEMBL25960309

SCHEMBL25960309

CCC(C)(C)OC(=O)N1CCCC1C(=O)OCCC[SiH3]

nearest known ligand 0.52

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
FKBP1A P62942 20/20 0.52
MTOR P42345 1/20 0.43
FKBP4 Q02790 1/20 0.43
FKBP5 Q13451 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960306 0.89 FKBP1A (0.47) FKBP1A
SCHEMBL25960272 0.89 FKBP1A (0.50) FKBP1A
SCHEMBL12215284 0.81 FKBP1A (0.52) FKBP1A
SCHEMBL18676059 0.81 FKBP1A (0.52) FKBP1A
SCHEMBL25960302 0.80 ATM (0.38) FKBP1A
SCHEMBL25960304 0.79 ALOX5AP (0.35) FKBP1A
SCHEMBL9773156 0.79 FKBP1A (0.50) FKBP1A
SCHEMBL4441024 0.79 FKBP1A (0.50) FKBP1A
SCHEMBL9893422 0.79 RAB9A (0.55)
SCHEMBL12769056 0.79 RAB9A (0.55)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed