SCHEMBL25969064

SCHEMBL25969064

CC(=O)NCNC(=O)c1ccccc1C(=O)O

nearest known ligand 0.59

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.59
APEX1 P27695 1/20 0.59
HTT P42858 2/20 0.55
KDM4E B2RXH2 1/20 0.53
TAAR1 Q96RJ0 1/20 0.53
CYP1A2 P05177 1/20 0.51
CYP2C19 P33261 1/20 0.51
ALDH1A1 P00352 2/20 0.50
GAA P10253 1/20 0.50
ALOX15 P16050 1/20 0.50
LMNA P02545 1/20 0.49
MAPT P10636 1/20 0.49
USP2 O75604 1/20 0.48
POLB P06746 1/20 0.47
TSHR P16473 1/20 0.47
MAPK1 P28482 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29067145 0.86 KMT2A (0.59) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL30569788 0.86 KMT2A (0.59) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL6268376 0.79 KMT2A (0.65) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL10889755 0.79 KMT2A (0.69) KMT2AAPEX1HTTKDM4ETAAR1
Hydrochloric Acid SCHEMBL5875464 0.78 KMT2A (0.62) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL15796793 0.77 KMT2A (0.67) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL10158103 0.76 HTT (0.68) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL772833 0.76 KMT2A (0.56) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL27478702 0.76 KMT2A (0.65) KMT2AAPEX1HTTKDM4ETAAR1
SCHEMBL30289977 0.76 KMT2A (0.65) KMT2AAPEX1HTTKDM4ETAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed