SCHEMBL25969090

SCHEMBL25969090

CC(=O)N(C(C)=O)c1cc(O)ccc1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.53
CYP2C9 P11712 3/20 0.53
ALOX15 P16050 3/20 0.53
HSD17B10 Q99714 3/20 0.53
MAPT P10636 3/20 0.53
MEN1 O00255 3/20 0.53
HPGD P15428 3/20 0.53
KMT2A Q03164 3/20 0.53
LMNA P02545 2/20 0.53
CYP1A2 P05177 2/20 0.53
CYP2C19 P33261 2/20 0.53
RGS12 O14924 1/20 0.53
USP2 O75604 1/20 0.53
POLB P06746 1/20 0.53
CYP2D6 P10635 1/20 0.53
THRB P10828 1/20 0.53
PKM P14618 1/20 0.53
NFKB1 P19838 1/20 0.53
APEX1 P27695 1/20 0.53
CASP1 P29466 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969084 0.85 GAA (0.47) ALDH1A1CYP2C9ALOX15HSD17B10MAPT
SCHEMBL9814181 0.80 HSD17B10 (0.45) ALDH1A1CYP2C9ALOX15HSD17B10MAPT
SCHEMBL28727007 0.78 ALDH1A1 (0.56) ALDH1A1CYP2C9ALOX15HSD17B10MAPT
SCHEMBL28021547 0.76 LMNA (0.53) ALDH1A1CYP2C9ALOX15HSD17B10MAPT
SCHEMBL11565235 0.76 GAA (0.61) ALDH1A1ALOX15HSD17B10MAPTMEN1
SCHEMBL5178635 0.73 MEN1 (0.47) ALDH1A1CYP2C9ALOX15HSD17B10MAPT
SCHEMBL9079910 0.73 ALDH1A1 (0.61) ALDH1A1CYP2C9ALOX15HSD17B10MAPT
SCHEMBL927389 0.72 ALDH1A1 (0.55) ALDH1A1CYP2C9ALOX15HSD17B10MAPT
SCHEMBL25969101 0.72 GAA (0.47) ALDH1A1MAPTMEN1HPGDKMT2A
SCHEMBL14925280 0.71 FSCN1 (0.52) ALDH1A1CYP2C9ALOX15HSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed