SCHEMBL25969146

SCHEMBL25969146

Cc1cc(C2(c3ccc(O)c(N4C(=O)c5ccc(C(c6ccc7c(c6)C(=O)N(C)C7=O)(C(F)(F)F)C(F)(F)F)cc5C4=O)c3)c3ccccc3-c3ccccc32)ccc1O

nearest known ligand 0.49

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.49
ESR2 Q92731 3/20 0.49
MEN1 O00255 2/20 0.40
LMNA P02545 2/20 0.40
MAPT P10636 2/20 0.40
KMT2A Q03164 2/20 0.40
XBP1 P17861 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
POLB P06746 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
NR1H3 Q13133 5/20 0.37
NR1H2 P55055 3/20 0.37
TYMS P04818 1/20 0.35
HSP90AA1 P07900 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969180 0.88 ESR1 (0.40) ESR1ESR2MEN1LMNAMAPT
SCHEMBL13933067 0.87 NR1H3 (0.39) ESR1ESR2MEN1KMT2ANPSR1
SCHEMBL2622758 0.85 ESR1 (0.41) ESR1ESR2MEN1MAPTKMT2A
SCHEMBL19627085 0.83 NR1H3 (0.37) ESR1ESR2MEN1MAPTKMT2A
SCHEMBL14208581 0.83 NR1H3 (0.36) ESR1ESR2MEN1MAPTKMT2A
SCHEMBL9891724 0.81 ESR1 (0.43) ESR1ESR2MEN1MAPTKMT2A
SCHEMBL9610064 0.81 TYMS (0.47) ESR1ESR2MEN1KMT2ANR1H3
SCHEMBL13933069 0.81 PGR (0.41) MEN1KMT2APOLBL3MBTL1NR1H3
SCHEMBL13966982 0.80 ESR1 (0.38) ESR1ESR2MEN1MAPTKMT2A
SCHEMBL15593256 0.79 APP (0.39) ESR1ESR2MEN1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed