SCHEMBL25969160

SCHEMBL25969160

Cc1cc(C(C)(C)c2ccc(O)c(N3C(=O)c4ccc(Oc5ccc(C(C)(C)c6ccc(Oc7ccc8c(c7)C(=O)N(C)C8=O)cc6)cc5)cc4C3=O)c2)ccc1O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.42
PKM P14618 1/20 0.41
MEN1 O00255 6/20 0.40
KMT2A Q03164 6/20 0.40
ALDH1A1 P00352 5/20 0.40
GAA P10253 1/20 0.40
BRD4 O60885 1/20 0.39
LPAR1 Q92633 1/20 0.38
LPAR3 Q9UBY5 1/20 0.38
ESR2 Q92731 1/20 0.38
NPSR1 Q6W5P4 1/20 0.37
KDM4E B2RXH2 2/20 0.36
HTT P42858 2/20 0.36
POLB P06746 2/20 0.36
MAPK1 P28482 2/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.34
MAPT P10636 1/20 0.34
TYMS P04818 1/20 0.34
APP P05067 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13595156 0.98 ESR1 (0.43) ESR1PKMMEN1KMT2AALDH1A1
SCHEMBL21933189 0.92 PKM (0.38) ESR1PKMMEN1KMT2AALDH1A1
SCHEMBL13966981 0.88 BRD4 (0.38) ESR1PKMMEN1KMT2AALDH1A1
SCHEMBL25969184 0.87 MEN1 (0.38) ESR1PKMMEN1KMT2AALDH1A1
SCHEMBL13292495 0.87 BRD4 (0.38) ESR1PKMMEN1KMT2AALDH1A1
SCHEMBL26374107 0.86 PKM (0.34) ESR1PKMMEN1KMT2AALDH1A1
SCHEMBL13411188 0.84 ESR1 (0.41) ESR1PKMMEN1KMT2AALDH1A1
SCHEMBL25969176 0.83 ESR1 (0.43) ESR1ALDH1A1ESR2KDM4ETYMS
SCHEMBL9891724 0.82 ESR1 (0.43) ESR1MEN1KMT2AALDH1A1ESR2
SCHEMBL30237601 0.82 ALDH1A1 (0.47) PKMMEN1KMT2AALDH1A1BRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230348767-A1 PROVISIONAL FIXATION MATERIAL AND METHOD FOR PRODUCING ELECTRONIC COMPONENT SEKISUI CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed