SCHEMBL25969504

SCHEMBL25969504

c1ccc(Oc2ccc(C3(c4ccc(Oc5ccccc5)cc4)CCCCC3)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.50
ESR2 Q92731 2/20 0.50
ALDH1A1 P00352 2/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
LTA4H P09960 3/20 0.48
TSHR P16473 1/20 0.48
PSMB1 P20618 1/20 0.46
PSMB5 P28074 1/20 0.46
PSMB2 P49721 1/20 0.46
HSD11B1 P28845 1/20 0.46
ADORA3 P0DMS8 1/20 0.45
NR1H2 P55055 1/20 0.43
BAX Q07812 1/20 0.43
MAOA P21397 1/20 0.43
MMP2 P08253 1/20 0.42
MMP3 P08254 1/20 0.42
MMP9 P14780 1/20 0.42
MMP8 P22894 1/20 0.42
MMP13 P45452 1/20 0.42
OPRM1 P35372 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13926354 0.83 ALDH1A1 (0.56) ESR1ESR2ALDH1A1L3MBTL1TSHR
SCHEMBL1305910 0.82 ALDH1A1 (0.77) ESR1ESR2ALDH1A1L3MBTL1LTA4H
SCHEMBL18780368 0.82 KMT2A (0.48) ALDH1A1L3MBTL1ADORA3MAPTSMN1; SMN2
SCHEMBL1257256 0.81 OPRM1 (0.59) ESR1ESR2ALDH1A1L3MBTL1LTA4H
SCHEMBL16395001 0.80 ADORA3 (0.43) ESR1ESR2ALDH1A1L3MBTL1PSMB1
SCHEMBL22003011 0.80 ADORA3 (0.50) ESR1ESR2ALDH1A1L3MBTL1PSMB1
SCHEMBL21785675 0.80 ADORA3 (0.50) ESR1ESR2ALDH1A1L3MBTL1PSMB1
SCHEMBL22811374 0.80 ADORA3 (0.43) ESR1ESR2ALDH1A1L3MBTL1TSHR
SCHEMBL16395122 0.80 ADORA3 (0.50) ESR1ESR2ALDH1A1L3MBTL1PSMB1
SCHEMBL24157288 0.80 ESR1 (0.58) ESR1ESR2ALDH1A1L3MBTL1OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed