SCHEMBL25979833

SCHEMBL25979833

CCC(C)(CC(O)COc1ccc(C(C)(C)c2ccc(OC(CC)(CC)CCOC)cc2)cc1)Oc1ccc(C(C)(C)c2ccc(OCC3CO3)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.51
MAPT P10636 4/20 0.51
MEN1 O00255 4/20 0.51
ALDH1A1 P00352 4/20 0.51
TP53 P04637 2/20 0.51
HPGD P15428 2/20 0.51
TSHR P16473 2/20 0.51
HIF1A Q16665 2/20 0.51
CYP1A2 P05177 1/20 0.51
PPARG P37231 1/20 0.51
HTT P42858 2/20 0.38
AR P10275 1/20 0.38
PKM P14618 2/20 0.33
CYP2D6 P10635 2/20 0.33
KDM4E B2RXH2 2/20 0.33
TDP1 Q9NUW8 1/20 0.32
NR3C1 P04150 1/20 0.32
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRA1A P35348 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24742917 0.90 ALDH1A1 (0.54) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL23837201 0.89 KMT2A (0.55) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL25747789 0.88 KMT2A (0.56) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL11920239 0.88 ALDH1A1 (0.56) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL18087501 0.86 ALDH1A1 (0.54) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL21064095 0.86 ALDH1A1 (0.54) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL20244248 0.85 ALDH1A1 (0.53) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL20662580 0.84 ALDH1A1 (0.56) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL20647773 0.84 KMT2A (0.51) KMT2AMAPTMEN1ALDH1A1TP53
SCHEMBL22015031 0.84 KMT2A (0.51) KMT2AMAPTMEN1ALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236505-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM SAN-APRO LTD. (JP) 2023-07-27 US disclosed