SCHEMBL26037226

SCHEMBL26037226

O=C(Oc1c(F)c(F)c(S(=O)(=O)O)c(F)c1F)c1cc(I)cc(I)c1

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ ACP1 P24666 1/20 0.30
▸ KMT2A Q03164 1/20 0.30
▸ TTR P02766 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22866012 0.80 POLB (0.33) —
SCHEMBL26938013 0.79 TTR (0.37) TTR
SCHEMBL13713552 0.78 TSHR (0.43) KMT2A
SCHEMBL24021501 0.74 — —
SCHEMBL26816354 0.73 F2 (0.33) —
SCHEMBL26206412 0.73 CA12 (0.35) —
SCHEMBL2742176 0.72 TDP1 (0.42) KMT2ATTR
SCHEMBL26103828 0.72 MAPT (0.46) KMT2A
SCHEMBL24846701 0.71 KMT2A (0.31) KMT2A
SCHEMBL6124939 0.71 POLB (0.34) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024150553-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND JSR株式会社 2024-07-18 — — WO disclosed
WO-2023157455-A1 RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2023-08-24 — — WO disclosed
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