SCHEMBL24021501

SCHEMBL24021501

O=C(Oc1c(F)c(F)c(S(=O)(=O)O)c(F)c1F)c1c(I)ccc(I)c1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24846701 0.81 KMT2A (0.31) —
SCHEMBL22866012 0.75 POLB (0.33) —
SCHEMBL26816354 0.74 F2 (0.33) —
SCHEMBL26037226 0.74 ACP1 (0.30) —
SCHEMBL13713552 0.73 TSHR (0.43) —
SCHEMBL21500854 0.72 SENP1 (0.33) —
SCHEMBL26938013 0.71 TTR (0.37) —
SCHEMBL22970148 0.71 F2 (0.38) —
SCHEMBL21500852 0.70 PSMG3 (0.35) —
SCHEMBL24846704 0.70 HPGD (0.49) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11175580-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-16 — — US disclosed
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