SCHEMBL260496

SCHEMBL260496

NC(=O)C1=CCc2ccccc2CC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NOTUM Q6P988 3/20 0.39
▸ NOS3 P29474 1/20 0.37
▸ NOS1 P29475 1/20 0.37
▸ NOS2 P35228 1/20 0.37
▸ ORAI1 Q96D31 1/20 0.36
▸ ORAI2 Q96SN7 1/20 0.36
▸ ORAI3 Q9BRQ5 1/20 0.36
▸ CYP2A6 P11509 1/20 0.36
▸ PARP1 P09874 2/20 0.36
▸ HSD17B3 P37058 2/20 0.36
▸ HTT P42858 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ MEN1 O00255 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ TSHR P16473 2/20 0.35
▸ POLB P06746 1/20 0.35
▸ CYP3A4 P08684 1/20 0.35
▸ MAPT P10636 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ RECQL P46063 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL950483 0.73 KDM1A (0.43) NOTUMNOS3NOS1NOS2ORAI1
SCHEMBL16682144 0.72 CYP2A6 (0.46) NOTUMNOS3NOS1NOS2ORAI1
SCHEMBL1259769 0.71 — —
SCHEMBL9336602 0.70 PARP1 (0.32) PARP1
SCHEMBL31548709 0.69 CYP1A2 (0.33) HTTSMN1; SMN2MEN1KMT2ACYP3A4
Hydroxyamine SCHEMBL27955185 0.68 TSHR (0.59) NOS3NOS1NOS2ORAI1ORAI2
SCHEMBL30640267 0.68 CYP1A2 (0.39) NOTUMCYP2A6MEN1KMT2ATSHR
SCHEMBL8131373 0.68 CYP1A2 (0.39) NOTUMCYP2A6MEN1KMT2ATSHR
Methane SCHEMBL28275755 0.68 — —
Urea SCHEMBL5312853 0.68 TSHR (0.60) NOTUMCYP2A6HTTSMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12013637-B2 Oxime ester compound and photopolymerization initiator containing same ADEKA CORPORATION (JP) 2024-06-18 — — US disclosed
US-11667730-B2 Oxime ester compound and photopolymerization initiator containing the same ADEKA CORPORATION (JP) 2023-06-06 — — US disclosed
EP-3819291-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING SAME ADEKA CORPORATION (JP) 2021-05-12 — — EP disclosed
EP-3753997-A1 LATENT ADDITIVE AND COMPOSITION CONTAINING LATENT ADDITIVE ADEKA CORPORATION (JP) 2020-12-23 — — EP disclosed
EP-2881450-B1 LATENT ADDITIVE AND COMPOSITION CONTAINING LATENT ADDITIVE ADEKA CORP (JP) 2020-09-09 — — EP disclosed
US-10734610-B2 Organic electroluminescent device UDC IRELAND LIMITED (IE) 2020-08-04 — — US disclosed
US-20190294044-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN USING SAME, AND METHOD OF MANUFACTURING PATTERN ADEKA CORPORATION (JP) 2019-09-26 — — US disclosed
US-10386721-B2 Pattern formation method and electronic device manufactured using same ADEKA CORPORATION (JP) 2019-08-20 — — US disclosed
US-10189847-B2 Oxime ester compound and photopolymerization initiator containing said compound ADEKA CORPORATION (JP) 2019-01-29 — — US disclosed
US-10061196-B2 Photosensitive composition, method for producing cured film, cured film, touch panel, and display device FUJIFILM CORPORATION (JP) 2018-08-28 — — US disclosed
EP-0520364-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1997-09-17 — — EP disclosed
US-5571642-A LIGHT SENSITIVE ELEMENTS WITH CHEMICAL RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 1996-11-05 — — US disclosed
US-5385807-A Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1995-01-31 — — US disclosed
EP-0332043-B1 Oxadiazole derivatives containing 4,6-bis-trichloromethyl-s-triazin-2-yl groups, process for their preparation and photosensitive mixture containing them HOECHST AG (DE) 1994-05-18 — — EP disclosed
EP-0332044-B1 HETEROCYCLIC COMPOUNDS CONTAINING 4,6-BIS-TRICHLOROMETHYL-S-TRIAZIN-2-YL GROUPS, PROCESS FOR THEIR PREPARATION AND PHOTOSENSITIVE MIXTURE CONTAINING THEM HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-16 — — EP disclosed
US-5216158-A Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-01 — — US disclosed
EP-0520364-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1992-12-30 — — EP disclosed
US-5055579-A Photoinitiators; high sensitivity in visible spectral range; stability HOECHST AKTIENGESELLSCHAFT (DE) 1991-10-08 — — US disclosed
EP-0332044-A1 Heterocyclic compounds containing 4,6-bis-trichloromethyl-s-triazin-2-yl groups, process for their preparation and photosensitive mixture containing them HOECHST AKTIENGESELLSCHAFT (DE) 1989-09-13 — — EP disclosed
EP-0332043-A1 Oxadiazole derivatives containing 4,6-bis-trichloromethyl-s-triazin-2-yl groups, process for their preparation and photosensitive mixture containing them HOECHST AKTIENGESELLSCHAFT (DE) 1989-09-13 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12013637-B2 Oxime ester compound and photopolymerization initiator containing same PPOX, PAM, OXER1 NOTUM 34/4885NOS3 99/4885NOS1 26/4885
US-11667730-B2 Oxime ester compound and photopolymerization initiator containing the same OXER1, CYP4A11, CYP4F11 NOTUM 1723/4885NOS3 292/4885NOS1 265/4885
US-10189847-B2 Oxime ester compound and photopolymerization initiator containing said compound PPOX, CCNO, MRTO4 NOTUM 1823/4885NOS3 87/4885NOS1 20/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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