SCHEMBL2605532

SCHEMBL2605532

CCOC(=O)c1ccc(C(=O)Nc2cc(Oc3ccc(O)c(NC(=O)c4ccc(C(=O)OCC)c(C)c4)c3)ccc2O)cc1C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.47
ALDH1A1 P00352 3/20 0.47
KMT2A Q03164 3/20 0.47
KDM4E B2RXH2 2/20 0.47
MEN1 O00255 2/20 0.47
MAPT P10636 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
ELANE P08246 1/20 0.47
PRTN3 P24158 1/20 0.47
TDP1 Q9NUW8 3/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
LMNA P02545 2/20 0.46
CA12 O43570 3/20 0.45
CA1 P00915 3/20 0.45
CA2 P00918 3/20 0.45
CA7 P43166 3/20 0.45
CA9 Q16790 3/20 0.45
CA14 Q9ULX7 3/20 0.45
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12937555 0.94 ALDH1A1 (0.45) POLBALDH1A1KMT2AKDM4EMEN1
SCHEMBL19846831 0.86 ELANE (0.43) POLBALDH1A1KMT2AKDM4EMEN1
SCHEMBL2605531 0.85 TDP1 (0.59) ALDH1A1KMT2AMEN1MAPTTDP1
SCHEMBL19846846 0.79 ALDH1A1 (0.44) POLBALDH1A1KMT2AKDM4EMEN1
SCHEMBL19846835 0.78 TDP1 (0.49) KMT2AMEN1MAPTTDP1LMNA
SCHEMBL19846843 0.78 KCNMA1 (0.62) ALDH1A1KMT2AMEN1MAPTTDP1
SCHEMBL19846832 0.75 KMT2A (0.61) POLBALDH1A1KMT2AKDM4EMEN1
SCHEMBL12510859 0.74 MEN1 (0.52) KMT2AMEN1MAPTKCNMA1TP53
SCHEMBL37983114 0.73 CA12 (0.62) POLBALDH1A1KMT2AKDM4EMEN1
SCHEMBL3045083 0.73 CA12 (0.62) POLBALDH1A1KMT2AKDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8883391-B2 Positive type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2014-11-11 US disclosed
US-8158324-B2 Positive-type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2012-04-17 US disclosed
US-20100099041-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2010-04-22 US disclosed