Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNMA1 | Q12791 | 2/20 | 0.66 |
| ▸ | NPC1 | O15118 | 9/20 | 0.66 |
| ▸ | RAB9A | P51151 | 8/20 | 0.66 |
| ▸ | MAPT | P10636 | 7/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.56 |
| ▸ | NFKB2 | Q00653 | 2/20 | 0.56 |
| ▸ | RELA | Q04206 | 2/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.56 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.56 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.56 |
| ▸ | KLK7 | P49862 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.55 |
| ▸ | TP53 | P04637 | 1/20 | 0.55 |
| ▸ | POLB | P06746 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2605548 | 0.88 | KCNMA1 (0.82) | KCNMA1NPC1RAB9AMAPTSMN1; SMN2 | |
| SCHEMBL6029542 | 0.86 | KCNMA1 (0.84) | KCNMA1NPC1RAB9AMAPTSMN1; SMN2 | |
| SCHEMBL13721353 | 0.85 | HPSE (0.57) | KCNMA1CYP3A4MEN1KMT2AHDAC1 | |
| SCHEMBL13213669 | 0.85 | KCNMA1 (0.68) | KCNMA1NPC1RAB9AMAPTSMN1; SMN2 | |
| SCHEMBL13958489 | 0.84 | MEN1 (0.66) | KCNMA1NPC1RAB9AMAPTSMN1; SMN2 | |
| SCHEMBL12704788 | 0.84 | NPC1 (0.77) | KCNMA1NPC1RAB9AMAPTSMN1; SMN2 | |
| SCHEMBL7817331 | 0.83 | HDAC1 (0.69) | KCNMA1NPC1RAB9AMAPTKDM4E | |
| SCHEMBL21360973 | 0.83 | KCNK3 (0.69) | KCNMA1NPC1RAB9AMAPTALDH1A1 | |
| SCHEMBL2605547 | 0.83 | KCNMA1 (0.64) | KCNMA1NPC1RAB9AMAPTSMN1; SMN2 | |
| SCHEMBL6580244 | 0.83 | NPC1 (0.64) | NPC1RAB9AMAPTSMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10908500-B2 | Cured film and method for producing same | TORAY INDUSTRIES, INC. (JP) | 2021-02-02 | — | — | US | disclosed |
| US-10696845-B2 | Energy-sensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-10545406-B2 | Cured film formed by curing photosensitive resin composition and method for manufacturing same | TORAY INDUSTRIES, INC. (JP) | 2020-01-28 | — | — | US | disclosed |
| US-20190225804-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-25 | — | — | US | disclosed |
| US-10197915-B2 | Resin and photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2019-02-05 | — | — | US | disclosed |
| US-20190004423-A1 | CURED FILM AND METHOD FOR PRODUCING SAME | TORAY INDUSTRIES, INC. (JP) | 2019-01-03 | — | — | US | disclosed |
| US-20180203353-A1 | CURED FILM AND METHOD FOR MANUFACTURING SAME | TORAY INDUSTRIES, INC. (JP) | 2018-07-19 | — | — | US | disclosed |
| US-20180039174-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| EP-2520977-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-11-22 | — | — | EP | disclosed |
| US-20170327644-A1 | RESIN AND PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2017-11-16 | — | — | US | disclosed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | disclosed |
| EP-1475665-B1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES (JP) | 2009-12-30 | — | — | EP | disclosed |
| EP-2110708-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-20080193718-A1 | Positive Photosensitive Resin Compositions, and Relief Patterns and Solid-State Image Sensors Made Thereof | TORAY INDUSTRIES, INC. (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080193718-A1 | Positive Photosensitive Resin Compositions, and Relief Patterns and Solid-State Image Sensors Made Thereof | TORAY INDUSTRIES, INC. (JP) | 2008-08-14 | — | — | US | disclosed |
| EP-1132773-B1 | POSITIVE-TYPE PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION | TORAY INDUSTRIES (JP) | 2007-07-11 | — | — | EP | disclosed |
| US-7214455-B2 | Photosensitive resin composition and process for producing heat-resistant resin film | TORAY INDUSTRIES, INC. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214455-B2 | Photosensitive resin composition and process for producing heat-resistant resin film | TORAY INDUSTRIES, INC. (JP) | 2007-05-08 | — | — | US | disclosed |