Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNMA1 | Q12791 | 4/20 | 0.62 |
| ▸ | NPC1 | O15118 | 5/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.51 |
| ▸ | MEN1 | O00255 | 2/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.51 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 4/20 | 0.49 |
| ▸ | AKT1 | P31749 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | SNCA | P37840 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2605538 | 0.91 | KCNMA1 (0.71) | KCNMA1NPC1MEN1KMT2AMAPT | |
| SCHEMBL12510861 | 0.88 | KCNMA1 (0.54) | KCNMA1NPC1MEN1KMT2AHDAC1 | |
| SCHEMBL10001969 | 0.87 | KMT2A (0.52) | KCNMA1NPC1MEN1KMT2AMAPT | |
| SCHEMBL13601071 | 0.87 | HDAC1 (0.60) | KCNMA1MEN1KMT2AMAPTTDP1 | |
| SCHEMBL12510753 | 0.86 | KCNMA1 (0.68) | KCNMA1NPC1ALDH1A1MEN1KMT2A | |
| SCHEMBL19846829 | 0.86 | KCNMA1 (0.63) | KCNMA1NPC1ALDH1A1MEN1KMT2A | |
| SCHEMBL19846834 | 0.86 | KCNMA1 (0.60) | KCNMA1NPC1ALDH1A1MEN1KMT2A | |
| SCHEMBL2605548 | 0.85 | KCNMA1 (0.82) | KCNMA1NPC1ALDH1A1MEN1KMT2A | |
| SCHEMBL14081561 | 0.85 | MAPT (0.50) | KCNMA1ALDH1A1MEN1KMT2AMAPT | |
| SCHEMBL7300963 | 0.85 | KCNMA1 (0.71) | KCNMA1NPC1ALDH1A1MAPTHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10696845-B2 | Energy-sensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-20190225804-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-25 | — | — | US | disclosed |
| US-10197915-B2 | Resin and photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2019-02-05 | — | — | US | disclosed |
| US-20180039174-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20180039174-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20170327644-A1 | RESIN AND PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2017-11-16 | — | — | US | disclosed |
| EP-1365289-B1 | PRECURSOR COMPOSITION FOR POSITIVE PHOTOSENSITIVE RESIN AND DISPLAY MADE WITH THE SAME | TORAY INDUSTRIES (JP) | 2016-04-20 | — | — | EP | disclosed |
| US-8883391-B2 | Positive type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2014-11-11 | — | — | US | disclosed |
| EP-1508837-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PREPARING HEAT-RESISTANT RESIN FILM | TORAY INDUSTRIES (JP) | 2014-10-15 | — | — | EP | disclosed |
| EP-2555053-A1 | Positive-type photosensitive resin composition | Toray Industries, Inc. (JP) | 2013-02-06 | — | — | EP | disclosed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | disclosed |
| EP-1475665-B1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES (JP) | 2009-12-30 | — | — | EP | disclosed |
| EP-2110708-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-20080193718-A1 | Positive Photosensitive Resin Compositions, and Relief Patterns and Solid-State Image Sensors Made Thereof | TORAY INDUSTRIES, INC. (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080193718-A1 | Positive Photosensitive Resin Compositions, and Relief Patterns and Solid-State Image Sensors Made Thereof | TORAY INDUSTRIES, INC. (JP) | 2008-08-14 | — | — | US | disclosed |
| EP-1132773-B1 | POSITIVE-TYPE PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION | TORAY INDUSTRIES (JP) | 2007-07-11 | — | — | EP | disclosed |
| US-7214455-B2 | Photosensitive resin composition and process for producing heat-resistant resin film | TORAY INDUSTRIES, INC. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214455-B2 | Photosensitive resin composition and process for producing heat-resistant resin film | TORAY INDUSTRIES, INC. (JP) | 2007-05-08 | — | — | US | disclosed |