Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 5/20 | 0.60 |
| ▸ | KCNMA1 | Q12791 | 4/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | APEX1 | P27695 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.46 |
| ▸ | ESRRG | P62508 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18360223 | 0.91 | HDAC1 (0.57) | HDAC1KCNMA1MEN1KMT2ALMNA | |
| SCHEMBL19986269 | 0.90 | HDAC1 (0.59) | HDAC1KCNMA1MEN1KMT2ALMNA | |
| SCHEMBL14081561 | 0.90 | MAPT (0.50) | HDAC1KCNMA1MEN1KMT2APKM | |
| SCHEMBL28918150 | 0.88 | MEN1 (0.56) | HDAC1KCNMA1MEN1KMT2ALMNA | |
| SCHEMBL29999394 | 0.88 | MEN1 (0.56) | HDAC1KCNMA1MEN1KMT2ALMNA | |
| SCHEMBL12510861 | 0.87 | KCNMA1 (0.54) | HDAC1KCNMA1MEN1KMT2AGAA | |
| SCHEMBL2605545 | 0.87 | KCNMA1 (0.62) | HDAC1KCNMA1MEN1KMT2ATDP1 | |
| SCHEMBL19600606 | 0.86 | HDAC1 (0.55) | HDAC1KCNMA1MEN1KMT2ALMNA | |
| SCHEMBL30790669 | 0.86 | HDAC1 (0.63) | HDAC1KCNMA1MEN1KMT2ALMNA | |
| SCHEMBL18360436 | 0.86 | HDAC1 (0.63) | HDAC1KCNMA1MEN1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025100308-A1 | RESIN COMPOSITION, CURED PRODUCT, AND DISPLAY DEVICE OR SEMICONDUCTOR DEVICE | 東レ株式会社 | 2025-05-15 | — | — | WO | disclosed |
| CN-119954849-A | Diamine monomer, slurry and polyimide film | 奥克控股集团股份公司 | 2025-05-09 | — | — | CN | disclosed |
| CN-112368641-B | Photosensitive resin composition, photosensitive sheet, cured film thereof, method for producing cured film, and electronic component | 东丽株式会社 | 2025-05-02 | — | — | CN | disclosed |
| CN-117991590-A | Photosensitive resin composition and photosensitive cured film | 上海八亿时空先进材料有限公司 | 2024-05-07 | — | — | CN | disclosed |
| CN-117964897-A | Alkali-soluble resin and application thereof | 上海八亿时空先进材料有限公司 | 2024-05-03 | — | — | CN | disclosed |
| US-11860538-B2 | Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device | FUJIFILM CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-11860538-B2 | Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device | FUJIFILM CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-11802181-B2 | Di-amine compound, and heat-resistant resin and resin composition using the same | TORAY INDUSTRIES, INC. (JP) | 2023-10-31 | — | — | US | disclosed |
| WO-2023139814-A1 | RESIN COMPOSITION, FILM, CURED MEMBRANE, SEMICONDUCTOR DEVICE, AND MULTILAYER CIRCUIT BOARD | 東レ株式会社 | 2023-07-27 | — | — | WO | disclosed |
| US-20230141241-A1 | SCINTILLATOR PANEL AND SCINTILLATOR PANEL MANUFACTURING METHOD | TORAY INDUSTRIES, INC. (JP) | 2023-05-11 | — | — | US | disclosed |
| EP-1744213-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-09-03 | — | — | EP | disclosed |
| EP-2469337-B1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-7638254-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2009-12-29 | — | — | US | disclosed |
| US-7638254-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090011364-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC PART | HATTORI TAKASHI | 2009-01-08 | — | — | US | disclosed |
| US-20090011364-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC PART | HATTORI TAKASHI | 2009-01-08 | — | — | US | disclosed |
| US-7435525-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7435525-B2 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20070122733-A1 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070122733-A1 | Positive photosensitive resin composition, method for forming pattern, and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11802181-B2 | Di-amine compound, and heat-resistant resin and resin composition using the same | CAD, ARID2, SMC3 | HDAC1 1226/4885KCNMA1 2594/4885MEN1 4033/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.