Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNMA1 | Q12791 | 2/20 | 0.61 |
| ▸ | MAPT | P10636 | 4/20 | 0.56 |
| ▸ | RAB9A | P51151 | 3/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | MEN1 | O00255 | 2/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.54 |
| ▸ | CA12 | O43570 | 3/20 | 0.51 |
| ▸ | CA1 | P00915 | 3/20 | 0.51 |
| ▸ | CA2 | P00918 | 3/20 | 0.51 |
| ▸ | CA9 | Q16790 | 3/20 | 0.51 |
| ▸ | NPC1 | O15118 | 3/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2605542 | 0.91 | KCNMA1 (0.69) | KCNMA1MAPTRAB9AALDH1A1CA12 | |
| SCHEMBL14228242 | 0.87 | MAPT (0.58) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL10001979 | 0.86 | KMT2A (0.52) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL13601066 | 0.85 | HDAC1 (0.60) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL12510752 | 0.85 | HDAC1 (0.63) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL19846842 | 0.85 | KMT2A (0.60) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL2605548 | 0.84 | KCNMA1 (0.82) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL6029542 | 0.82 | KCNMA1 (0.84) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL2605535 | 0.82 | MEN1 (0.52) | KCNMA1MAPTRAB9AALDH1A1MEN1 | |
| SCHEMBL21360975 | 0.82 | GAA (0.69) | KCNMA1MAPTRAB9AALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180039174-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20180039174-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| EP-2520977-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-11-22 | — | — | EP | disclosed |
| EP-1365289-B1 | PRECURSOR COMPOSITION FOR POSITIVE PHOTOSENSITIVE RESIN AND DISPLAY MADE WITH THE SAME | TORAY INDUSTRIES (JP) | 2016-04-20 | — | — | EP | disclosed |
| US-8883391-B2 | Positive type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2014-11-11 | — | — | US | disclosed |
| EP-1508837-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PREPARING HEAT-RESISTANT RESIN FILM | TORAY INDUSTRIES (JP) | 2014-10-15 | — | — | EP | disclosed |
| EP-2555053-A1 | Positive-type photosensitive resin composition | Toray Industries, Inc. (JP) | 2013-02-06 | — | — | EP | disclosed |
| EP-2110708-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2012-12-05 | — | — | EP | disclosed |
| EP-2520977-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2012-11-07 | — | — | EP | disclosed |
| US-20120251949-A1 | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | disclosed |
| EP-1475665-B1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES (JP) | 2009-12-30 | — | — | EP | disclosed |
| EP-2110708-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-20080193718-A1 | Positive Photosensitive Resin Compositions, and Relief Patterns and Solid-State Image Sensors Made Thereof | TORAY INDUSTRIES, INC. (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080193718-A1 | Positive Photosensitive Resin Compositions, and Relief Patterns and Solid-State Image Sensors Made Thereof | TORAY INDUSTRIES, INC. (JP) | 2008-08-14 | — | — | US | disclosed |
| US-7214455-B2 | Photosensitive resin composition and process for producing heat-resistant resin film | TORAY INDUSTRIES, INC. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214455-B2 | Photosensitive resin composition and process for producing heat-resistant resin film | TORAY INDUSTRIES, INC. (JP) | 2007-05-08 | — | — | US | disclosed |