Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11989211 | 0.75 | SLC6A4 (0.35) | POLBALDH1A1LMNA | |
| SCHEMBL12858245 | 0.74 | KMT2A (0.39) | POLBMEN1KMT2AKDM4EHSD17B10 | |
| SCHEMBL12551159 | 0.73 | SLC6A4 (0.35) | TSHRALDH1A1SMN1; SMN2 | |
| SCHEMBL18775964 | 0.72 | PER2 (0.33) | — | |
| SCHEMBL13564252 | 0.72 | SLC6A3 (0.35) | MEN1KMT2A | |
| SCHEMBL502008 | 0.71 | ATM (0.41) | MEN1KMT2AALDH1A1SMN1; SMN2GAA | |
| SCHEMBL14424136 | 0.70 | ATM (0.40) | MEN1KMT2AKDM4EHSD17B10ALDH1A1 | |
| SCHEMBL15826724 | 0.69 | ALDH1A1 (0.41) | MEN1KMT2AHSD17B10ALDH1A1 | |
| SCHEMBL14305160 | 0.68 | KDM4E (0.53) | POLBMEN1KMT2AKDM4EHSD17B10 | |
| SCHEMBL835061 | 0.67 | HSD17B10 (0.52) | POLBMEN1KMT2AKDM4EHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |