SCHEMBL26163161

SCHEMBL26163161

CC(F)(F)COC(=O)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
HTT P42858 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19472473 0.87 POLB (0.33) POLBNPSR1HTTALDH1A1
SCHEMBL24142154 0.82 HTT (0.48) POLBNPSR1HTTALDH1A1
SCHEMBL10095089 0.82 POLB (0.30) POLBNPSR1
SCHEMBL24436923 0.82 HTT (0.32) POLBNPSR1HTT
SCHEMBL24436922 0.82 LMNA (0.32) POLBNPSR1
SCHEMBL24177994 0.80 ALDH1A1 (0.32) ALDH1A1
SCHEMBL12895536 0.79 PRKCA (0.41) POLBNPSR1HTTALDH1A1
SCHEMBL26479981 0.79 POLB (0.34) POLBNPSR1ALDH1A1
SCHEMBL14827780 0.77 POLB (0.31) POLBNPSR1
SCHEMBL24436723 0.77 SERPINE1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR POLB 154/4885NPSR1 2668/4885HTT 594/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.