SCHEMBL26163196

SCHEMBL26163196

Cc1cc(COC(=O)C(O)(C(F)(F)F)C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MRGPRX4 Q96LA9 3/20 0.41
IDO1 P14902 2/20 0.39
ENPP2 Q13822 1/20 0.38
PRKCA P17252 1/20 0.36
PRKCD Q05655 1/20 0.36
MAOB P27338 2/20 0.36
TAS2R14 Q9NYV8 1/20 0.36
MAPT P10636 1/20 0.36
TACR1 P25103 2/20 0.35
THRB P10828 1/20 0.35
GPR35 Q9HC97 1/20 0.35
IDH1 O75874 1/20 0.35
MMP1 P03956 1/20 0.34
MMP12 P39900 1/20 0.34
KDM4E B2RXH2 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24142274 0.90 IDO1 (0.49) MRGPRX4IDO1PRKCAPRKCDMAOB
SCHEMBL17552787 0.82 MRGPRX4 (0.41) MRGPRX4IDO1ENPP2PRKCAPRKCD
SCHEMBL26163195 0.78 MAOB (0.49) IDO1PRKCAPRKCDMAOBTHRB
SCHEMBL24142273 0.78 PRKCA (0.59) MRGPRX4IDO1PRKCAPRKCDMAOB
SCHEMBL26163160 0.77 MAOB (0.44) MAOBMAPTMMP1MMP12NPSR1
SCHEMBL24142275 0.77 MAOB (0.50) IDO1MAOBMMP1MMP12MEN1
SCHEMBL798798 0.77 MRGPRX4 (0.41) MRGPRX4IDO1ENPP2PRKCAPRKCD
SCHEMBL24901134 0.75 MMP2 (0.42) MRGPRX4IDO1MAOBMMP1MMP12
SCHEMBL27255656 0.75 IDO1 (0.50) IDO1PRKCAPRKCDMAOBMAPT
SCHEMBL28032625 0.73 ENPP2 (0.52) ENPP2TACR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR MRGPRX4 2180/4885IDO1 2388/4885ENPP2 4170/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.