SCHEMBL2616658

SCHEMBL2616658

CO[Si](CCCCS(=O)(=O)O)(OC)OC

nearest known ligand 0.39

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.39
EPHX2 P34913 1/20 0.34
LMNA P02545 2/20 0.33
PTGS1 P23219 1/20 0.32
PDE4A P27815 1/20 0.32
SLC6A6 P31641 1/20 0.32
CYP2C19 P33261 1/20 0.32
BLM P54132 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4309125 0.93 APP (0.41) APPEPHX2LMNAPTGS1PDE4A
SCHEMBL14090746 0.84 PTGS1 (0.36) APPLMNAPTGS1PDE4ASLC6A6
SCHEMBL16804318 0.84 LMNA (0.57) APPLMNA
SCHEMBL2514544 0.83 SLC2A1 (0.33) APPEPHX2
SCHEMBL2489697 0.81 LMNA (0.54) APPLMNA
SCHEMBL2490043 0.81 LTA4H (0.36) APP
SCHEMBL6726780 0.81 APP (0.32) APPLMNA
SCHEMBL28783562 0.79 APP (0.37) APPEPHX2LMNAPTGS1PDE4A
SCHEMBL5848227 0.79
SCHEMBL31199148 0.78 EPHX2 (0.38) APPEPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182968-B2 Color filter and method for producing the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-8158307-B2 Forming first color pattern in repeating pattern on substrate; forming second color pattern on substrate; removal by dry etching; forming third color pattern FUJIFILM CORPORATION (JP) 2012-04-17 US disclosed
US-7989143-B2 Method of manufacturing a semiconductor device having an organic thin film transistor HITACHI, LTD. (JP) 2011-08-02 US disclosed
US-7585713-B2 Method for exposing photo-sensitive SAM film and method for manufacturing semiconductor device HITACHI, LTD. (JP) 2009-09-08 US disclosed
US-20080286665-A1 COLOR FILTER AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2008-11-20 US disclosed
US-20080268582-A1 Method for Exposing Photo-Sensitive SAM Film and Method for Manufacturing Semiconductor Device HITACHI, LTD. (JP) 2008-10-30 US disclosed
US-20080206659-A1 COLOR FILTER AND METHOD OF MANUFACTURING THE SAME, AND SOLID-STATE IMAGE PICKUP ELEMENT FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20070281384-A1 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE HAVING AN ORGANIC THIN FILM TRANSISTOR HITACHI, LTD. (JP) 2007-12-06 US disclosed