Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 10/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 9/20 | 0.40 |
| ▸ | SLC6A2 | P23975 | 6/20 | 0.40 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.39 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.39 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.37 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.37 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26188240 | 0.99 | OPRM1 (0.39) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 | |
| SCHEMBL26188250 | 0.97 | SLC6A3 (0.37) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 | |
| SCHEMBL26188238 | 0.96 | OPRM1 (0.36) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 | |
| SCHEMBL13346718 | 0.86 | SLC6A3 (0.43) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 | |
| SCHEMBL26188237 | 0.86 | ADORA3 (0.39) | OPRM1ADORA3ALDH1A1 | |
| SCHEMBL13346719 | 0.85 | OPRM1 (0.42) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 | |
| SCHEMBL26188241 | 0.85 | OPRM1 (0.38) | OPRM1ADORA3ALDH1A1 | |
| SCHEMBL22858405 | 0.83 | SLC6A3 (0.46) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 | |
| SCHEMBL13346738 | 0.83 | SLC6A3 (0.41) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 | |
| SCHEMBL13346775 | 0.83 | SLC6A3 (0.40) | SLC6A3SLC6A4SLC6A2OPRM1ALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11747726-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-05 | — | — | US | disclosed |