SCHEMBL2625635

SCHEMBL2625635

CCOC(=O)C(F)(F)CC(F)(F)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
ALDH1A1 P00352 3/20 0.37
PIN1 Q13526 1/20 0.37
PKM P14618 2/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
LMNA P02545 1/20 0.36
HSD17B10 Q99714 1/20 0.36
CYP4F2 P78329 2/20 0.35
CYP4A11 Q02928 2/20 0.35
THRB P10828 1/20 0.35
MAPT P10636 2/20 0.35
ALOX15 P16050 1/20 0.34
MGAM O43451 1/20 0.34
GAA P10253 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
SOAT1 P35610 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2625616 0.78 PTPN1 (0.34) ALDH1A1MEN1KMT2AGAA
SCHEMBL25288443 0.78
SCHEMBL1681615 0.78 CYP4F2 (0.44) POLBNPSR1ALDH1A1PIN1PKM
SCHEMBL10891188 0.77 POLB (0.42) POLBNPSR1ALDH1A1PIN1PKM
SCHEMBL14135896 0.76 ALDH1A1 (0.36) ALDH1A1THRBCYP2D6HIF1A
Trifluoroacetic Acid SCHEMBL29384363 0.76 ALOX15 (0.37) POLBNPSR1ALDH1A1PIN1PKM
SCHEMBL2625645 0.76 CYP4F2 (0.41) POLBNPSR1ALDH1A1PKMKDM4E
SCHEMBL936998 0.76 PKM (0.48) POLBNPSR1ALDH1A1PIN1PKM
Trifluoroacetic Acid SCHEMBL10523981 0.76 ALDH1A1 (0.42) POLBNPSR1ALDH1A1PIN1PKM
SCHEMBL3372776 0.76 ALDH1A1 (0.42) POLBNPSR1ALDH1A1PIN1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9291893-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-22 US disclosed
US-20120156620-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-06-21 US disclosed
US-20120100483-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-26 US disclosed