SCHEMBL2630167

SCHEMBL2630167

CCc1ccc(CSC(=S)N(CC)CC)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.52
MGLL Q99685 4/20 0.50
PHGDH O43175 3/20 0.50
PKM P14618 3/20 0.47
SMN1; SMN2 Q16637 4/20 0.45
NPC1 O15118 3/20 0.45
RAB9A P51151 3/20 0.45
ALDH1A1 P00352 10/20 0.45
ALDH2 P05091 3/20 0.45
LMNA P02545 4/20 0.43
HPGD P15428 4/20 0.43
CYP3A4 P08684 2/20 0.43
PLIN1 O60240 1/20 0.43
GMNN O75496 1/20 0.43
TRPA1 O75762 1/20 0.43
ABCB11 O95342 1/20 0.43
TP53 P04637 1/20 0.43
CYP1A2 P05177 1/20 0.43
HSP90AA1 P07900 1/20 0.43
HTR1A P08908 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3143432 0.94 MGLL (0.56) IDO1MGLLPHGDHPKMSMN1; SMN2
SCHEMBL19468107 0.89 MGLL (0.50) IDO1MGLLPHGDHPKMSMN1; SMN2
SCHEMBL11949111 0.87 IDO1 (0.50) IDO1MGLLPHGDHPKMSMN1; SMN2
SCHEMBL19494606 0.87 ALDH1A1 (0.60) MGLLPHGDHPKMSMN1; SMN2NPC1
SCHEMBL19468332 0.86 ALDH1A1 (0.61) IDO1MGLLPHGDHPKMSMN1; SMN2
SCHEMBL19468125 0.86 ALDH1A1 (0.59) IDO1MGLLPHGDHPKMSMN1; SMN2
SCHEMBL1146677 0.86 MGLL (0.47) IDO1MGLLPHGDHPKMSMN1; SMN2
SCHEMBL148444 0.85 MGLL (0.59) IDO1MGLLPHGDHPKMSMN1; SMN2
SCHEMBL19494802 0.84 PKM (0.47) MGLLPHGDHPKMSMN1; SMN2NPC1
SCHEMBL19468266 0.84 MGLL (0.46) MGLLPHGDHPKMSMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9893366-B2 Metal fine particle association and method for producing the same NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY (JP) 2018-02-13 US disclosed
US-20170260400-A1 PHOTOCURABLE PRIMER FOR ELECTROLESS PLATING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-09-14 US disclosed
US-20170240764-A1 PHOTOSENSITIVE ELECTROLESS PLATING UNDERCOAT AGENT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-08-24 US disclosed
US-20170240764-A1 PHOTOSENSITIVE ELECTROLESS PLATING UNDERCOAT AGENT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-08-24 US disclosed
EP-3190463-A1 PHOTOSENSITIVE ELECTROLESS PLATING UNDERCOAT AGENT Nissan Chemical Industries, Ltd. (JP) 2017-07-12 EP disclosed
US-9650534-B2 Primer for electroless plating comprising hyperbranched polymer and metal fine particles NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-05-16 US disclosed
US-9243084-B2 Method for producing chlorinated hyperbranched polymer KYUSHU UNIVERSITY (JP) 2016-01-26 US disclosed
US-20160010215-A1 PRIMER FOR ELECTROLESS PLATING NISSAN CHEMICAL IND LTD (JP) 2016-01-14 US disclosed
US-20150030967-A1 METAL FINE PARTICLE ASSOCIATION AND METHOD FOR PRODUCING THE SAME NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY (JP) 2015-01-29 US disclosed
US-20150030967-A1 METAL FINE PARTICLE ASSOCIATION AND METHOD FOR PRODUCING THE SAME NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY (JP) 2015-01-29 US disclosed
US-20140072822-A1 PRIMER FOR ELECTROLESS PLATING COMPRISING HYPERBRANCHED POLYMER AND METAL FINE PARTICLES NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-13 US disclosed
US-20140073744-A1 METHOD FOR PRODUCING CHLORINATED HYPERBRANCHED POLYMER NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-13 US disclosed
US-20140072822-A1 PRIMER FOR ELECTROLESS PLATING COMPRISING HYPERBRANCHED POLYMER AND METAL FINE PARTICLES NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-13 US disclosed