SCHEMBL26312818

SCHEMBL26312818

C=C(C)C(=O)Oc1ccc(C(=O)OCCCC(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.43
STS P08842 8/20 0.43
POLB P06746 1/20 0.42
APEX1 P27695 1/20 0.42
HTT P42858 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
LMNA P02545 2/20 0.39
CYP1A2 P05177 2/20 0.39
TSHR P16473 2/20 0.39
CYP2C19 P33261 2/20 0.39
ESR1 P03372 1/20 0.39
CYP2D6 P10635 1/20 0.39
MAPK1 P28482 1/20 0.39
NR1H2 P55055 1/20 0.39
RNASEL Q05823 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2C9 P11712 1/20 0.39
PDE4D Q08499 1/20 0.39
HPGD P15428 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10134907 0.86 ELANE (0.47) ELANESTSPOLBAPEX1HTT
SCHEMBL26312913 0.86 STS (0.42) STSTDP1LMNACYP1A2TSHR
SCHEMBL16020888 0.83 ELANE (0.44) ELANESTSPOLBAPEX1HTT
SCHEMBL26312823 0.82 POLB (0.49) ELANESTSPOLBAPEX1HTT
SCHEMBL7763002 0.80 LMNA (0.60) ELANESTSPOLBAPEX1HTT
SCHEMBL12376766 0.79 ELANE (0.50) ELANESTSPOLBAPEX1HTT
SCHEMBL13572063 0.78 STS (0.58) STSPOLBAPEX1HTTTDP1
SCHEMBL18232589 0.78 TDP1 (0.60) STSPOLBTDP1LMNAESR1
SCHEMBL4905422 0.77 MAPT (0.59) STSPOLBAPEX1HTTTDP1
SCHEMBL16351870 0.77 TDP1 (0.54) ELANESTSPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed