SCHEMBL26312913

SCHEMBL26312913

C=C(C)c1ccc(C(=O)OCCCC(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STS P08842 8/20 0.42
TSHR P16473 3/20 0.41
LMNA P02545 2/20 0.41
CYP1A2 P05177 2/20 0.41
CYP2C19 P33261 2/20 0.41
ESR1 P03372 2/20 0.41
CYP2D6 P10635 1/20 0.41
MAPK1 P28482 1/20 0.41
NR1H2 P55055 1/20 0.41
RNASEL Q05823 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
PDE4D Q08499 1/20 0.40
HPGD P15428 1/20 0.40
RECQL P46063 1/20 0.40
TDP1 Q9NUW8 2/20 0.40
ALDH1A1 P00352 2/20 0.39
NPC1 O15118 1/20 0.39
MAPT P10636 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312818 0.86 ELANE (0.43) STSTSHRLMNACYP1A2CYP2C19
SCHEMBL25455816 0.83 MAPK1 (0.39) STSTSHRLMNACYP1A2ESR1
SCHEMBL18232589 0.83 TDP1 (0.60) STSLMNAESR1MAPK1SMN1; SMN2
SCHEMBL26312911 0.79 STS (0.47) STSTSHRLMNACYP1A2CYP2C19
SCHEMBL26312908 0.76 MAPK1 (0.40) STSTSHRLMNACYP1A2CYP2C19
SCHEMBL18232588 0.75 ALDH1A1 (0.45) TSHRLMNASMN1; SMN2ALDH1A1RAB9A
SCHEMBL14946684 0.75 TDP1 (0.54) TSHRLMNAESR1MAPK1SMN1; SMN2
SCHEMBL14330819 0.73 MAPK1 (0.37) STSLMNACYP1A2ESR1CYP2D6
SCHEMBL28034831 0.73 ALDH1A1 (0.69) STSTSHRLMNACYP1A2CYP2C19
SCHEMBL28154492 0.73 ALDH1A1 (0.69) STSTSHRLMNACYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed