Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 11/20 | 0.37 |
| ▸ | ADRB1 | P08588 | 11/20 | 0.37 |
| ▸ | ADRB3 | P13945 | 11/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.34 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14330819 | 0.75 | MAPK1 (0.37) | ADRB2ADRB1ADRB3GAAKMT2A | |
| SCHEMBL25455816 | 0.74 | MAPK1 (0.39) | ADRB2ADRB1ADRB3MAPTALDH1A1 | |
| SCHEMBL26312908 | 0.72 | MAPK1 (0.40) | ALDH1A1GAAKMT2APKMMAPK1 | |
| SCHEMBL25455817 | 0.70 | CA12 (0.35) | MAPTALDH1A1KMT2AMAPK1 | |
| SCHEMBL14330820 | 0.70 | MAPK1 (0.43) | ADRB2ADRB1ADRB3MAPTALDH1A1 | |
| SCHEMBL26312913 | 0.70 | STS (0.42) | MAPTALDH1A1GAAMAPK1HPGD | |
| SCHEMBL26312911 | 0.70 | STS (0.47) | MAPTALDH1A1GAAMAPK1HPGD | |
| SCHEMBL18775773 | 0.68 | TDP1 (0.41) | ADRB2ADRB1ADRB3MAPTALDH1A1 | |
| SCHEMBL13957369 | 0.67 | CA1 (0.66) | MAPTALDH1A1GAAKMT2AHPGD | |
| SCHEMBL16451617 | 0.67 | ADRB2 (0.47) | ADRB2ADRB1ADRB3MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |