SCHEMBL26312908

SCHEMBL26312908

C=C(C)c1ccc(C(=O)OCCC(C(F)(F)F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.40
PKM P14618 2/20 0.40
HSD17B10 Q99714 1/20 0.40
STS P08842 8/20 0.35
ALDH1A1 P00352 3/20 0.35
ESR1 P03372 2/20 0.35
TSHR P16473 2/20 0.35
CHRM1 P11229 1/20 0.35
SLC6A2 P23975 1/20 0.35
KDR P35968 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
NR1H2 P55055 1/20 0.33
RNASEL Q05823 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15084182 0.85 TDP1 (0.47) MAPK1PKMALDH1A1ESR1SLC6A2
SCHEMBL25455817 0.77 CA12 (0.35) MAPK1ALDH1A1TSHRTDP1CA1
SCHEMBL26312913 0.76 STS (0.42) MAPK1STSALDH1A1ESR1TSHR
SCHEMBL25455816 0.75 MAPK1 (0.39) MAPK1STSALDH1A1ESR1TSHR
SCHEMBL17266482 0.73 ALDH1A1 (0.43) MAPK1HSD17B10ALDH1A1TSHRSMN1; SMN2
SCHEMBL15084175 0.73 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2LMNAHPGDKDM4E
SCHEMBL26312910 0.72 ADRB2 (0.37) MAPK1PKMHSD17B10ALDH1A1HPGD
SCHEMBL24268482 0.72 ESR1 (0.48) MAPK1ALDH1A1ESR1TSHRCHRM1
SCHEMBL13828783 0.72 EPHX2 (0.40) MAPK1PKMHSD17B10STSALDH1A1
SCHEMBL24268514 0.71 MAPK1 (0.36) MAPK1PKMHSD17B10STSALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed