⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26312945 | 0.82 | — | — | |
| SCHEMBL26312929 | 0.81 | ESR1 (0.39) | — | |
| SCHEMBL26312850 | 0.76 | — | — | |
| SCHEMBL12376766 | 0.74 | ELANE (0.50) | — | |
| SCHEMBL26312948 | 0.73 | ELANE (0.32) | — | |
| SCHEMBL26312949 | 0.71 | TDP1 (0.35) | — | |
| SCHEMBL1574171 | 0.71 | ELANE (0.40) | — | |
| SCHEMBL19756069 | 0.70 | ESR1 (0.34) | — | |
| SCHEMBL26312810 | 0.70 | SERPINE1 (0.47) | — | |
| SCHEMBL19756067 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |