Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.34 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.34 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.34 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.34 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.34 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26312793 | 0.85 | GABRA1 (0.33) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL25476726 | 0.82 | TSHR (0.30) | — | |
| SCHEMBL26313010 | 0.79 | ESR1 (0.36) | — | |
| SCHEMBL25952440 | 0.76 | TSHR (0.30) | — | |
| SCHEMBL18775746 | 0.75 | KDM4E (0.45) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL11953039 | 0.75 | UTS2R (0.41) | — | |
| SCHEMBL18775913 | 0.74 | CYP1A2 (0.39) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL18775772 | 0.74 | MEN1 (0.41) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL25956419 | 0.73 | MGLL (0.34) | — | |
| SCHEMBL22941016 | 0.72 | ELANE (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |