Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9608680 | 0.86 | ALDH1A1 (0.33) | ALDH1A1LMNAHSD11B1 | |
| SCHEMBL25619192 | 0.83 | ALDH1A1 (0.31) | ALDH1A1LMNAHSD11B1 | |
| SCHEMBL683427 | 0.83 | ALDH1A1 (0.34) | ALDH1A1LMNAHSD11B1 | |
| SCHEMBL26939426 | 0.82 | HSD11B1 (0.33) | ALDH1A1HSD11B1 | |
| SCHEMBL14539797 | 0.80 | — | — | |
| SCHEMBL12425735 | 0.79 | CYP17A1 (0.39) | — | |
| SCHEMBL19261148 | 0.79 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL950003 | 0.78 | — | — | |
| SCHEMBL13094605 | 0.77 | ALDH1A1 (0.36) | ALDH1A1LMNAHSD11B1 | |
| SCHEMBL953131 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8017302-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-13 | — | — | US | disclosed |
| US-20090186297-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090075202-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-20080008959-A1 | Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution; forms a pattern with high rectangularity | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |