SCHEMBL26317191

SCHEMBL26317191

C=Cc1ccc(S(=O)(=O)Oc2cccc(F)c2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR17 Q13304 2/20 0.44
P2RY2 P41231 1/20 0.44
TDP1 Q9NUW8 4/20 0.41
ALDH1A1 P00352 6/20 0.40
LMNA P02545 3/20 0.40
MAPT P10636 3/20 0.40
HPGD P15428 2/20 0.40
SMN1; SMN2 Q16637 3/20 0.39
HTT P42858 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
MMP2 P08253 1/20 0.38
MMP3 P08254 1/20 0.38
MMP9 P14780 1/20 0.38
MMP14 P50281 1/20 0.38
KDM4E B2RXH2 1/20 0.37
GAA P10253 2/20 0.37
MAPK1 P28482 1/20 0.37
HTR2A P28223 1/20 0.36
G6PD P11413 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4132077 0.81 ALDH1A1 (0.55) GPR17P2RY2TDP1ALDH1A1LMNA
SCHEMBL26317184 0.81 TDP1 (0.51) TDP1ALDH1A1LMNAMAPTHPGD
SCHEMBL4126727 0.80 ALDH1A1 (0.52) GPR17P2RY2TDP1ALDH1A1LMNA
SCHEMBL28279658 0.80 TDP1 (0.50) TDP1ALDH1A1LMNAMAPTHPGD
SCHEMBL28850001 0.74 CA1 (0.41) LMNAHPGDMMP2MMP3MMP9
SCHEMBL1143736 0.74 TDP1 (0.61) TDP1ALDH1A1LMNAMAPTHPGD
SCHEMBL26317194 0.73 TDP1 (0.47) TDP1ALDH1A1LMNAMAPTSMN1; SMN2
SCHEMBL18631973 0.72 CA1 (0.45) GPR17P2RY2HPGDMMP2MMP3
SCHEMBL31464210 0.72 ALDH1A1 (0.51) TDP1ALDH1A1LMNAMAPTHTT
SCHEMBL1143598 0.72 ALDH1A1 (0.51) TDP1ALDH1A1LMNAMAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296983-A1 PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-09-21 US disclosed
US-20230296983-A1 PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-09-21 US disclosed