SCHEMBL1143598

SCHEMBL1143598

C=Cc1ccc(OS(=O)(=O)c2ccc(C)cc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.51
KMT2A Q03164 3/20 0.50
MEN1 O00255 2/20 0.50
MAPT P10636 1/20 0.50
HTT P42858 1/20 0.50
LMNA P02545 1/20 0.50
MGAM O43451 1/20 0.48
CA2 P00918 3/20 0.47
CA12 O43570 2/20 0.47
PPARG P37231 1/20 0.47
KDM4E B2RXH2 2/20 0.47
POLB P06746 1/20 0.46
ENPP3 O14638 2/20 0.46
ENPP1 P22413 2/20 0.46
ENPP2 Q13822 2/20 0.46
TDP1 Q9NUW8 1/20 0.46
CA1 P00915 1/20 0.46
CA9 Q16790 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31464210 1.00 ALDH1A1 (0.51) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL4126086 0.86 MEN1 (0.60) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL9852204 0.86 MEN1 (0.60) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL18179825 0.86 MEN1 (0.60) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL2236226 0.85 ALDH1A1 (0.62) ALDH1A1KMT2AMEN1MAPTHTT
Iodide SCHEMBL22068772 0.84 CA2 (0.59) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL1143736 0.83 TDP1 (0.61) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL26317184 0.83 TDP1 (0.51) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL28279658 0.81 TDP1 (0.50) ALDH1A1KMT2AMEN1MAPTHTT
SCHEMBL27848097 0.81 MEN1 (0.53) ALDH1A1KMT2AMEN1MAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3532898-B1 METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER FRAUNHOFER GES FORSCHUNG (DE) 2024-07-31 EP claimed
US-11292859-B2 Method for producing a polymer by nitroxyl-controlled polymerisation, and polymer FRAUNHOFER-GESELLSCHAFT ZURFÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2022-04-05 US claimed
US-20190248927-A1 METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. (DE) 2019-08-15 US claimed
JP-60230136-A None JP disclosed
EP-3532898-B1 METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER FRAUNHOFER GES FORSCHUNG (DE) 2024-07-31 EP disclosed
CN-110100205-B Method for producing polymers by controlled nitrogen-oxygen polymerization and polymers 弗劳恩霍夫应用研究促进协会 2022-12-30 CN disclosed
US-11292859-B2 Method for producing a polymer by nitroxyl-controlled polymerisation, and polymer FRAUNHOFER-GESELLSCHAFT ZURFÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2022-04-05 US disclosed
US-20190248927-A1 METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. (DE) 2019-08-15 US disclosed
US-8993212-B2 Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-03-31 US disclosed
US-8822588-B2 Fluorine-containing polymer and anti-static agent wherein same is used CENTRAL GLASS COMPANY, LIMITED (JP) 2014-09-02 US disclosed
US-8592540-B2 Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2013-11-26 US disclosed
US-20110065857-A1 Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used CENTRAL GLASS COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-7906269-B2 Positive-type resist composition CENTRAL GLASS COMPANY, LIMITED (JP) 2011-03-15 US disclosed
EP-2289954-A1 FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED Central Glass Company, Limited (JP) 2011-03-02 EP disclosed
US-7887990-B2 Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-02-15 US disclosed
US-20090061353-A1 Positive-Type Resist Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2009-03-05 US disclosed
US-20090011199-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2009-01-08 US disclosed
US-20080311507-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2008-12-18 US disclosed
US-6284863-B1 REACTED WITH UNSATURATED AMIDES THAT MAY BE CYCLIC, E.G., N-VINYL-2-PYRROLIDONE SUMITOMO CHEMICAL COMPANY, LTD. (JP) 2001-09-04 US disclosed
JP-S60230136-A POSITIVE TYPE RESIST COMPOSITION FUJITSU LTD 1985-11-15 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080311507-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same FRG1, FBXL19, FEM1B ALDH1A1 2430/4885KMT2A 274/4885MEN1 577/4885
US-20090011199-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same FGFR2, RTF1, ADGRF1 ALDH1A1 3871/4885KMT2A 166/4885MEN1 1618/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.