SCHEMBL2632727

SCHEMBL2632727

CC(=O)CCCCCc1ccccc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.71
RXFP1 Q9HBX9 1/20 0.71
ALDH1A1 P00352 1/20 0.70
ALOX5 P09917 3/20 0.62
HDAC1 Q13547 2/20 0.62
HDAC2 Q92769 2/20 0.62
CES1 P23141 4/20 0.61
FAAH O00519 4/20 0.61
HDAC3 O15379 1/20 0.59
MAPK1 P28482 1/20 0.59
ADRA1A P35348 1/20 0.59
HDAC4 P56524 1/20 0.59
SLC6A3 Q01959 1/20 0.59
SMN1; SMN2 Q16637 1/20 0.59
HDAC7 Q8WUI4 1/20 0.59
HDAC10 Q969S8 1/20 0.59
HDAC11 Q96DB2 1/20 0.59
HDAC8 Q9BY41 1/20 0.59
HDAC6 Q9UBN7 1/20 0.59
HDAC9 Q9UKV0 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19149704 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL547835 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL12040622 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL8104136 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL5681573 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL6213668 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL24340640 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL13498521 1.00 MAPT (0.71) MAPTRXFP1ALDH1A1ALOX5HDAC1
SCHEMBL1105483 0.98 ALDH1A1 (0.73) MAPTRXFP1ALDH1A1ALOX5HDAC1
Formaldehyde SCHEMBL6456543 0.94 ALDH1A1 (0.68) MAPTRXFP1ALDH1A1ALOX5HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070287699-A1 ANTIVIRAL AGENTS VIROBAY, INC. (US) 2007-12-13 US claimed
CN-112218844-B Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2024-04-26 CN disclosed
CN-115968391-B Composition, resin, method for producing amorphous film, method for forming resist pattern, method for producing underlayer film for lithography, and method for forming circuit pattern 三菱瓦斯化学株式会社 2024-04-26 CN disclosed
CN-111655662-B Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2023-09-26 CN disclosed
CN-116710500-A Polymer, composition, method for producing polymer, composition for forming film, resist composition, method for forming resist pattern, radiation-sensitive composition, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, method for forming circuit pattern, and composition for forming optical member 三菱瓦斯化学株式会社 2023-09-05 CN disclosed
CN-116529671-A Polycyclic polyphenol resin, composition, method for producing polycyclic polyphenol resin, composition for film formation, resist composition, method for forming resist pattern, radiation-sensitive composition, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, method for forming circuit pattern, and composition for forming optical member 三菱瓦斯化学株式会社 2023-08-01 CN disclosed
CN-116194502-A Polymer, composition, method for producing polymer, composition, film-forming composition, resist composition, radiation-sensitive composition, underlayer film-forming composition for lithography, resist pattern-forming method, method for producing underlayer film for lithography, circuit pattern-forming method, and composition for forming optical member 三菱瓦斯化学株式会社 2023-05-30 CN disclosed
CN-115968391-A Composition, resin, method for producing amorphous film, method for forming resist pattern, method for producing underlayer film for lithography, and method for forming circuit pattern 三菱瓦斯化学株式会社 2023-04-14 CN disclosed
CN-113365967-A Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2021-09-07 CN disclosed
CN-113302223-A Film-forming composition, resist composition, radiation-sensitive composition, method for producing amorphous film, method for forming resist pattern, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, and method for forming circuit pattern 三菱瓦斯化学株式会社 2021-08-24 CN disclosed
US-20120101026-A1 Compounds For Enzyme Inhibition ONYX THERAPEUTICS, INC. (US) 2012-04-26 US disclosed
EP-2260835-A2 Composition for proteasome inhibition Proteolix, Inc. (US) 2010-12-15 EP disclosed
EP-2261236-A2 Composition for proteasome inhibition Proteolix, Inc. (US) 2010-12-15 EP disclosed
US-7737112-B2 Composition for enzyme inhibition ONYX THERAPEUTICS, INC. (US) 2010-06-15 US disclosed
US-20090239891-A1 Sustained Release Dosage Forms of Analgesic Medications UNVERSITY OF TENNESSEE RESEARCH FOUNDATION 2009-09-24 US disclosed
US-20080090785-A1 Peptide-based compounds include at least three peptide units, an epoxide or aziridine, and functionalization at the N-terminus inhibit specific activities of N-terminal nucleophile (Ntn) hydrolases, e.g., the chymotrypsin-like activity of the 20S proteasome; antiproliferative and antiinflammatory agents PROTEOLIX, INC. (US) 2008-04-17 US disclosed
US-20070287699-A1 ANTIVIRAL AGENTS VIROBAY, INC. (US) 2007-12-13 US disclosed
WO-2007103185-A2 SUSTAINED RELEASE DOSAGE FORMS OF ANALAGESIC MEDICATIONS UNIVERSITY OF TENNESSEE RESEARCH FOUNDATION (US) 2007-09-13 WO disclosed
EP-1118629-B1 Polyhydroxyalkanoates and method of producing them by utilizing microorganisms CANON KK (JP) 2007-04-25 EP disclosed
WO-2006063154-A1 COMPOSITION FOR PROTEASOME INHIBITION PROTEOLIX, INC. (US) 2006-06-15 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080090785-A1 Peptide-based compounds include at least three peptide units, an epoxide or aziridine, and functionalization at the N-terminus inhibit specific activities of N-terminal nucleophile (Ntn) hydrolases, e.g., the chymotrypsin-like activity of the 20S proteasome; antiproliferative and antiinflammatory agents ANPEP, DNPEP, CPN1 MAPT 4108/4885RXFP1 3005/4885ALDH1A1 3376/4885
US-20120101026-A1 Compounds For Enzyme Inhibition ANPEP, DNPEP, CPN1 MAPT 3999/4885RXFP1 3467/4885ALDH1A1 3059/4885
US-20070287699-A1 ANTIVIRAL AGENTS EIF2AK2, MAVS, ZC3HAV1 MAPT 4635/4885RXFP1 4526/4885ALDH1A1 1759/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.