SCHEMBL26327980

SCHEMBL26327980

CC(O)(c1ccc(Cc2ccc(N)c(C(O)(C(F)(F)F)C(F)(F)F)c2)cc1N)C(F)(F)F

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.51
GAA P10253 4/20 0.37
KDM4E B2RXH2 4/20 0.37
MEN1 O00255 4/20 0.37
MAPT P10636 4/20 0.37
KMT2A Q03164 4/20 0.37
POLB P06746 2/20 0.37
RAB9A P51151 1/20 0.37
ALDH1A1 P00352 4/20 0.34
MAPK1 P28482 2/20 0.34
LMNA P02545 1/20 0.34
HTT P42858 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
HSD17B10 Q99714 3/20 0.33
HPGD P15428 2/20 0.33
ALOX15 P16050 2/20 0.33
TSHR P16473 2/20 0.33
GLA P06280 1/20 0.33
ATM Q13315 1/20 0.33
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15744799 0.94 SMN1; SMN2 (0.48) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL26328002 0.93 SMN1; SMN2 (0.55) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL25587354 0.90 SMN1; SMN2 (0.54) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL10002079 0.87 SMN1; SMN2 (0.45) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL10036535 0.87 SMN1; SMN2 (0.61) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL29353699 0.87 SMN1; SMN2 (0.61) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL13224570 0.82 SMN1; SMN2 (0.53) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL10002085 0.81 ALDH1A1 (0.42) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL10036534 0.81 SMN1; SMN2 (0.54) SMN1; SMN2GAAKDM4EMEN1MAPT
SCHEMBL26327982 0.78 SMN1; SMN2 (0.51) SMN1; SMN2GAAKDM4EMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230287178-A1 Fluorinated Diamine or Salt Thereof, Method for Producing Fluorinated Diamine or Salt Thereof, Polyamide, Method for Producing Polyamide, Polyamide Solution, Cyclized Polyamide, Method for Producing Cyclized Polyamide, Insulation for High-Frequency Electronic Component, Method for Producing Insulation for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Appliance, and Insulating Material for Producing High-Frequency Electronic Component CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-14 US disclosed