SCHEMBL26343095

SCHEMBL26343095

O=C(CC(F)(F)C(=O)O)Oc1ccc(I)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.41
▸ ALDH1A1 P00352 2/20 0.41
▸ LMNA P02545 1/20 0.41
▸ MAPT P10636 1/20 0.41
▸ HTT P42858 1/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ TRPV1 Q8NER1 3/20 0.40
▸ RXRA P19793 1/20 0.37
▸ RXRB P28702 1/20 0.37
▸ ELANE P08246 1/20 0.35
▸ TPMT P51580 1/20 0.34
▸ HIF1A Q16665 2/20 0.34
▸ ESR1 P03372 1/20 0.34
▸ RECQL P46063 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ EPAS1 Q99814 1/20 0.33
▸ HDAC1 Q13547 1/20 0.33
▸ HDAC7 Q8WUI4 1/20 0.33
▸ HDAC8 Q9BY41 1/20 0.33
▸ HDAC6 Q9UBN7 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24361100 0.76 ELANE (0.39) TRPV1RXRARXRBELANETPMT
SCHEMBL26343100 0.75 POLB (0.32) —
SCHEMBL27483364 0.74 KMT2A (0.44) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL24361871 0.74 KMT2A (0.44) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL24360875 0.73 VCAM1 (0.39) TRPV1RXRARXRBELANETPMT
SCHEMBL23843700 0.72 PTPN1 (0.37) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL8207857 0.72 KMT2A (0.55) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL4246892 0.71 KMT2A (0.63) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL326469 0.71 ELANE (0.44) TRPV1RXRARXRBELANETPMT
SCHEMBL28464321 0.71 KMT2A (0.44) KMT2AALDH1A1LMNAMAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
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