SCHEMBL2638490

SCHEMBL2638490

C=C(C)C(=O)C(C=O)COP(=O)(O)O

nearest known ligand 0.44

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MPI P34949 1/20 0.44
PGK1 P00558 1/20 0.39
PGK2 P07205 1/20 0.39
PGD P52209 5/20 0.37
LPAR6 P43657 1/20 0.32
LPAR1 Q92633 1/20 0.32
LPAR4 Q99677 1/20 0.32
LPAR5 Q9H1C0 1/20 0.32
LPAR2 Q9HBW0 1/20 0.32
LPAR3 Q9UBY5 1/20 0.32
ENPP2 Q13822 1/20 0.32
BTN3A1 O00481 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2639606 0.90 MPI (0.33) MPIBTN3A1
SCHEMBL3330100 0.88 TSHR (0.32) MPI
SCHEMBL11860852 0.77 PGK1 (0.57) MPIPGK1PGK2PGDLPAR6
SCHEMBL27997830 0.75 PGK1 (0.55) MPIPGK1PGK2PGDLPAR6
SCHEMBL28186199 0.75 S1PR1 (0.45) MPIPGK1PGK2PGD
SCHEMBL28098834 0.72 PGK1 (0.39) MPIPGK1PGK2PGDLPAR6
SCHEMBL3911043 0.71 PGD (0.38) MPIPGK1PGK2PGDLPAR1
SCHEMBL9795776 0.71 GABRR1 (0.34)
Methacrylic Acid SCHEMBL28655463 0.69 PGK1 (0.52) MPIPGK1PGK2PGDLPAR6
SCHEMBL28124018 0.69 PGK1 (0.43) MPIPGK1PGK2PGDLPAR6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2011524023-A 2011-08-25 JP claimed
US-20100136484-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-06-03 US claimed
WO-2009146400-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-12-03 WO claimed
JP-2110178-A None JP disclosed
US-8221958-B2 Photosensitive paste and sintered layer E.I. DU PONT DE NEMOURS AND COMPANY (US) 2012-07-17 US disclosed
US-20100136484-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-06-03 US disclosed
WO-2009146400-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-12-03 WO disclosed
JP-H02110178-A SINGLE COMPONENT VISIBLE LIGHT HARDENING LIQUID ADHESIVE COMPOSITE IMPERIAL CHEM IND PLC <ICI> 1990-04-23 JP disclosed