SCHEMBL3330100

SCHEMBL3330100

C=C(C)C(=O)C(C=O)COP(=O)(OCC(C=O)C(=O)C(=C)C)OCC(C=O)C(=O)C(=C)C

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32
MPI P34949 1/20 0.31
CYP3A4 P08684 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2638490 0.88 MPI (0.44) MPI
SCHEMBL2639606 0.88 MPI (0.33) TSHRMPI
SCHEMBL9795776 0.68 GABRR1 (0.34)
SCHEMBL3463715 0.67
SCHEMBL3462653 0.66
SCHEMBL715271 0.66 TSHR (0.46) TSHRCYP3A4L3MBTL1
SCHEMBL8857353 0.64
SCHEMBL7560995 0.64
SCHEMBL3519470 0.63 LAP3 (0.30)
SCHEMBL11860852 0.63 PGK1 (0.57) TSHRMPI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100136484-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-06-03 US claimed
US-8221958-B2 Photosensitive paste and sintered layer E.I. DU PONT DE NEMOURS AND COMPANY (US) 2012-07-17 US disclosed
US-20100136484-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-06-03 US disclosed