SCHEMBL26412404

SCHEMBL26412404

CC(C)(OC(=O)c1ccccc1N)C1CCNCC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 12/20 0.46
HSD17B10 Q99714 9/20 0.46
CFTR P13569 1/20 0.46
KDM4E B2RXH2 6/20 0.43
TSHR P16473 3/20 0.43
POLB P06746 2/20 0.43
HPGD P15428 4/20 0.40
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
LMNA P02545 1/20 0.38
CYP2D6 P10635 1/20 0.38
HRH1 P35367 1/20 0.38
SCN1A P35498 1/20 0.38
SCN2A Q99250 1/20 0.38
SCN3A Q9NY46 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
GLA P06280 2/20 0.37
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
TP53 P04637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373529 0.90 CYP2D6 (0.42) ALDH1A1TSHRMEN1KMT2ALMNA
SCHEMBL22373121 0.86 PARP1 (0.41) MEN1KMT2ALMNACYP2D6HRH1
SCHEMBL22372815 0.85 CYP2D6 (0.39) TSHRMEN1KMT2ALMNACYP2D6
SCHEMBL22373190 0.85 LMNA (0.45) ALDH1A1HSD17B10KDM4ETSHRHPGD
SCHEMBL22373064 0.85 RXFP1 (0.44) ALDH1A1TSHRPOLBHPGDMEN1
SCHEMBL22373123 0.85 HTR2C (0.40) ALDH1A1MEN1KMT2ALMNACYP2D6
SCHEMBL26477546 0.84 KMT2A (0.40) ALDH1A1TSHRHPGDMEN1KMT2A
SCHEMBL22277402 0.84 PTPN2 (0.43) MEN1KMT2ALMNACYP2D6HRH1
SCHEMBL22373184 0.83 G6PD (0.41) KDM4ETSHRMEN1KMT2ALMNA
SCHEMBL22373369 0.83 MAPT (0.45) ALDH1A1HPGDMEN1KMT2ACDK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885HSD17B10 4557/4885CFTR 1591/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.