Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 5/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 5/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 4/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | OPRM1 | P35372 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26413401 | 0.90 | P4HB (0.38) | SLC6A2SLC6A4SLC6A3CYP2D6OPRM1 | |
| SCHEMBL24943671 | 0.90 | CYP2D6 (0.45) | SLC6A2SLC6A4SLC6A3CYP2D6OPRM1 | |
| SCHEMBL26478646 | 0.89 | OPRM1 (0.39) | SLC6A4OPRM1 | |
| SCHEMBL26413512 | 0.89 | OPRM1 (0.41) | SLC6A2SLC6A4SLC6A3CYP2D6OPRM1 | |
| SCHEMBL24943688 | 0.89 | CYP2D6 (0.45) | SLC6A2SLC6A4SLC6A3CYP2D6OPRM1 | |
| SCHEMBL26478651 | 0.89 | OPRM1 (0.39) | SLC6A2SLC6A4SLC6A3CYP2D6OPRM1 | |
| SCHEMBL26413416 | 0.87 | OPRM1 (0.39) | SLC6A4OPRM1 | |
| SCHEMBL24944087 | 0.87 | SIGMAR1 (0.38) | OPRM1MAPT | |
| SCHEMBL24943690 | 0.87 | KMT2A (0.43) | CYP2D6OPRM1ALDH1A1MAPT | |
| SCHEMBL24944083 | 0.86 | OPRM1 (0.40) | SLC6A2SLC6A4SLC6A3OPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | HNRNPU, NSUN2, HNRNPR | SLC6A2 2338/4885SLC6A4 2893/4885SLC6A3 1449/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.