SCHEMBL26413448

SCHEMBL26413448

COCCOCCOCC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 7/20 0.42
OPRD1 P41143 3/20 0.41
OPRK1 P41145 3/20 0.41
DRD3 P35462 2/20 0.37
OPRL1 P41146 2/20 0.37
TACR1 P25103 3/20 0.36
CHRM2 P08172 2/20 0.34
CHRM1 P11229 2/20 0.34
CYP3A4 P08684 2/20 0.34
KDM4E B2RXH2 1/20 0.34
SLC22A1 O15245 1/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
THRB P10828 1/20 0.34
TSHR P16473 1/20 0.34
PRCP P42785 1/20 0.34
HTT P42858 1/20 0.34
TMEM97 Q5BJF2 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413538 0.88 OPRM1 (0.43) OPRM1OPRD1OPRK1DRD3CHRM2
SCHEMBL24944596 0.87 OPRM1 (0.48) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26413335 0.85 OPRM1 (0.45) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26413316 0.85 OPRM1 (0.52) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24944036 0.82 OPRM1 (0.37) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24943983 0.81 TACR1 (0.53) OPRM1TACR1KCNH2
SCHEMBL24944629 0.79 OPRM1 (0.58) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24944608 0.78 OPRM1 (0.44) OPRM1OPRD1OPRK1DRD3ALDH1A1
SCHEMBL24943733 0.78 POLB (0.50) OPRM1OPRL1ALDH1A1LMNATSHR
SCHEMBL24944034 0.77 OPRM1 (0.48) OPRM1OPRD1OPRK1DRD3TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885OPRD1 1348/4885OPRK1 1644/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.