SCHEMBL26413489

SCHEMBL26413489

O=C(Cc1ccc(Cl)cc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.52

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
PTGDR2 Q9Y5Y4 1/20 0.43
OPRM1 P35372 1/20 0.41
TACR1 P25103 1/20 0.41
GFER P55789 1/20 0.40
ATM Q13315 1/20 0.40
KLK7 P49862 4/20 0.40
DRD2 P14416 1/20 0.40
STS P08842 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
MAPT P10636 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
MEN1 O00255 1/20 0.38
GPR183 P32249 1/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944885 0.91 OPRM1 (0.46) OPRM1TACR1L3MBTL1
SCHEMBL24944042 0.88 FNTA (0.43) OPRM1TACR1L3MBTL1
SCHEMBL24943729 0.88 OPRM1 (0.42) OPRM1TACR1L3MBTL1
SCHEMBL26478728 0.87 OPRM1 (0.41) OPRM1TACR1L3MBTL1MAPTGPR183
SCHEMBL26413731 0.87 OPRM1 (0.47) OPRM1TACR1L3MBTL1TDP1KMT2A
SCHEMBL26478928 0.87 OPRM1 (0.41) OPRM1TACR1L3MBTL1
SCHEMBL24944096 0.86 ALDH1A1 (0.42)
SCHEMBL24944618 0.86 TACR1 (0.44) OPRM1TACR1ATMMEN1KMT2A
SCHEMBL24943734 0.85 ALDH1A1 (0.46) OPRM1TACR1ATMKLK7L3MBTL1
SCHEMBL24944632 0.84 CA2 (0.47) OPRM1TACR1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR PTGDR2 2954/4885OPRM1 775/4885TACR1 2183/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.