SCHEMBL26426944

SCHEMBL26426944

O=C(CCCOC(=O)c1cc(I)cc(I)c1I)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ OPRM1 P35372 4/20 0.35
▸ DRD3 P35462 1/20 0.33
▸ TACR1 P25103 1/20 0.32
▸ HDAC3 O15379 1/20 0.31
▸ HDAC4 P56524 1/20 0.31
▸ HDAC1 Q13547 1/20 0.31
▸ HDAC7 Q8WUI4 1/20 0.31
▸ HDAC2 Q92769 1/20 0.31
▸ HDAC10 Q969S8 1/20 0.31
▸ HDAC11 Q96DB2 1/20 0.31
▸ HDAC8 Q9BY41 1/20 0.31
▸ HDAC6 Q9UBN7 1/20 0.31
▸ HDAC9 Q9UKV0 1/20 0.31
▸ HDAC5 Q9UQL6 1/20 0.31
▸ TDP1 Q9NUW8 2/20 0.30
▸ TSHR P16473 2/20 0.30
▸ L3MBTL1 Q9Y468 1/20 0.30
▸ OPRD1 P41143 3/20 0.30
▸ OPRK1 P41145 3/20 0.30
▸ TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426943 0.94 OPRM1 (0.36) OPRM1DRD3TACR1HDAC3HDAC4
SCHEMBL26426966 0.91 OPRM1 (0.34) OPRM1DRD3TACR1TDP1TSHR
SCHEMBL26426941 0.88 OPRM1 (0.37) OPRM1DRD3TACR1OPRD1OPRK1
SCHEMBL26426881 0.87 OPRM1 (0.37) OPRM1TACR1HDAC1
SCHEMBL26426965 0.85 OPRM1 (0.35) OPRM1DRD3TACR1OPRD1OPRK1
SCHEMBL26426884 0.83 OPRM1 (0.34) OPRM1TACR1
SCHEMBL26426885 0.80 OPRM1 (0.33) OPRM1TACR1
SCHEMBL26426887 0.80 HTR2A (0.35) OPRM1TACR1
SCHEMBL26426964 0.79 OPRM1 (0.37) OPRM1DRD3TACR1OPRD1OPRK1
SCHEMBL26426903 0.79 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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