SCHEMBL26426965

SCHEMBL26426965

O=C(CCOC(=O)c1cc(I)cc(I)c1O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ OPRM1 P35372 4/20 0.35
▸ TACR1 P25103 1/20 0.32
▸ DRD3 P35462 1/20 0.32
▸ OPRD1 P41143 3/20 0.31
▸ OPRK1 P41145 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426966 0.94 OPRM1 (0.34) OPRM1TACR1DRD3OPRD1OPRK1
SCHEMBL26426943 0.91 OPRM1 (0.36) OPRM1TACR1DRD3OPRD1OPRK1
SCHEMBL26426964 0.90 OPRM1 (0.37) OPRM1TACR1DRD3OPRD1OPRK1
SCHEMBL26426913 0.89 OPRM1 (0.36) OPRM1TACR1
SCHEMBL26426944 0.85 OPRM1 (0.35) OPRM1TACR1DRD3OPRD1OPRK1
SCHEMBL26426914 0.85 OPRM1 (0.34) OPRM1TACR1
SCHEMBL26426918 0.82 HTR2A (0.35) OPRM1TACR1
SCHEMBL26426916 0.82 OPRM1 (0.33) OPRM1TACR1
SCHEMBL26426932 0.81 TTR (0.31) —
SCHEMBL26426941 0.81 OPRM1 (0.37) OPRM1TACR1DRD3OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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