Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 4/20 | 0.34 |
| ▸ | DRD3 | P35462 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | TACR1 | P25103 | 1/20 | 0.31 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.30 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26426965 | 0.94 | OPRM1 (0.35) | OPRM1DRD3TACR1OPRD1OPRK1 | |
| SCHEMBL26426944 | 0.91 | OPRM1 (0.35) | OPRM1DRD3TDP1TACR1OPRD1 | |
| SCHEMBL26426964 | 0.88 | OPRM1 (0.37) | OPRM1DRD3TACR1OPRD1OPRK1 | |
| SCHEMBL26426913 | 0.87 | OPRM1 (0.36) | OPRM1TACR1 | |
| SCHEMBL26426943 | 0.85 | OPRM1 (0.36) | OPRM1DRD3TACR1OPRD1OPRK1 | |
| SCHEMBL26426914 | 0.83 | OPRM1 (0.34) | OPRM1TACR1 | |
| SCHEMBL26426918 | 0.81 | HTR2A (0.35) | OPRM1TACR1 | |
| SCHEMBL26426916 | 0.81 | OPRM1 (0.33) | OPRM1TACR1 | |
| SCHEMBL26426932 | 0.79 | TTR (0.31) | — | |
| SCHEMBL26426941 | 0.79 | OPRM1 (0.37) | OPRM1DRD3TACR1OPRD1OPRK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |