⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26426988 | 0.93 | — | — | |
| SCHEMBL26426968 | 0.92 | — | — | |
| SCHEMBL26426992 | 0.85 | — | — | |
| SCHEMBL26426950 | 0.82 | — | — | |
| SCHEMBL26426881 | 0.77 | OPRM1 (0.37) | — | |
| SCHEMBL26426957 | 0.77 | — | — | |
| SCHEMBL22277799 | 0.76 | — | — | |
| SCHEMBL26426945 | 0.76 | OPRM1 (0.32) | — | |
| SCHEMBL26426983 | 0.75 | — | — | |
| SCHEMBL26426884 | 0.73 | OPRM1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |