SCHEMBL26426975

SCHEMBL26426975

O=C(OC1(c2ccccc2)CCNCC1)C1C2CC3C(OS(=O)(=O)C31)C2OC(=O)C12CCC3CCC(CC3C1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944337 0.89 KDM4E (0.31) —
SCHEMBL26414374 0.82 ALDH1A1 (0.35) —
SCHEMBL24944346 0.81 CHRNA7 (0.31) —
SCHEMBL24944339 0.80 POLB (0.30) —
SCHEMBL24944120 0.76 OPRD1 (0.30) —
SCHEMBL26426959 0.74 — —
SCHEMBL26426987 0.73 — —
SCHEMBL26479482 0.72 — —
SCHEMBL24943783 0.72 KDM4E (0.31) —
SCHEMBL26427905 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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