SCHEMBL26453033

SCHEMBL26453033

CCC(C)(C(=O)OC1CCCCC1)c1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.50
ALDH1A1 P00352 1/20 0.40
ALOX15 P16050 1/20 0.40
MAPK1 P28482 1/20 0.40
MAPK10 P53779 1/20 0.40
HSD17B10 Q99714 1/20 0.40
MIF P14174 1/20 0.39
CHRM3 P20309 5/20 0.39
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
EPHX1 P07099 1/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
HTT P42858 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
MLNR O43193 1/20 0.38
CHRM2 P08172 1/20 0.38
CHRM1 P11229 1/20 0.38
HTR2A P28223 1/20 0.38
HTR2C P28335 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26102432 0.82 CYP19A1 (0.55) CYP19A1ALDH1A1ALOX15MAPK1MAPK10
SCHEMBL31205909 0.80 CYP19A1 (0.46) CYP19A1ALDH1A1ALOX15MAPK1MAPK10
SCHEMBL28253790 0.74 ELANE (0.51) ALDH1A1HSD17B10ESR1ESR2CHRM2
SCHEMBL26465336 0.74 ALDH1A1 (0.54) CYP19A1ALDH1A1ALOX15MAPK1MAPK10
SCHEMBL192800 0.73 CYP19A1 (0.45) CYP19A1ALDH1A1ALOX15MAPK1MAPK10
SCHEMBL19772600 0.72 EPHX1 (0.47) CYP19A1ALDH1A1CHRM3EPHX1NPC1
SCHEMBL10410235 0.72 NAAA (0.49) CYP19A1ALDH1A1ALOX15MAPK1MAPK10
SCHEMBL10915986 0.72 CHRM3 (0.47) CYP19A1CHRM3CHRM2CHRM1HRH1
SCHEMBL131561 0.72 EPHX1 (0.50) CYP19A1CHRM3EPHX1NPC1RAB9A
SCHEMBL108478 0.72 EPHX1 (0.50) CYP19A1CHRM3EPHX1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230139009-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-05-04 US disclosed