SCHEMBL265168

SCHEMBL265168

CC1COC(C)(C)OC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL9619314 0.87 MAPK1 (0.38)
SCHEMBL12191971 0.76
SCHEMBL23664235 0.73 ALDH1A1 (0.37)
SCHEMBL10265510 0.73 PABPC1 (0.32)
SCHEMBL6389818 0.73 PABPC1 (0.36)
SCHEMBL6388243 0.71 PABPC1 (0.39)
SCHEMBL12352831 0.71 MEN1 (0.34)
SCHEMBL8833046 0.71 APP (0.33)
SCHEMBL6258850 0.71
SCHEMBL2569196 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6337176-B1 COLOR REPRODUCTION AND SHARPNESS; RAPID PROCESSING FUJI PHOTO FILM CO., LTD. (JP) 2002-01-08 US claimed
US-12087564-B2 Tuned synthetic dendrimer calibrants for mass spectrometry THE ADMINISTRATORS OF THE TULANE EDUCATIONAL FUND (US) 2024-09-10 US disclosed
EP-3893645-B1 SUBSTITUTED ARYLMETHYLUREAS AND HETEROARYLMETHYLUREAS, ANALOGUES THEREOF, AND METHODS USING SAME ARBUTUS BIOPHARMA CORP (CA) 2024-04-17 EP disclosed
US-11873439-B2 Polymerisable liquid crystal material and polymerised liquid crystal film MERCK PATENT GMBH (DE) 2024-01-16 US disclosed
US-11819531-B2 Multifunctional zwitterionic polymer conjugates KODIAK SCIENCES INC. (US) 2023-11-21 US disclosed
US-11820932-B2 Polymerisable liquid crystal material and polymerised liquid crystal film MERCK PATENT GMBH (DE) 2023-11-21 US disclosed
US-20230365511-A1 Antiviral Pyrazolopiridinone Compounds NOVARTIS AG (CH) 2023-11-16 US disclosed
US-11796918-B2 Underlayer material for photoresist TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-10-24 US disclosed
US-11796918-B2 Underlayer material for photoresist TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-10-24 US disclosed
US-11787788-B2 Benzimidazole derivatives, and pharmaceutical compositions and methods of use thereof CAPELLA THERAPEUTICS, INC. (US) 2023-10-17 US disclosed
EP-1329160-A2 4-ACYLAMINOPYRAZOLE DERIVATIVES Sankyo Company, Limited (JP) 2003-07-23 EP disclosed
EP-1252143-A1 METHOD FOR PREPARING ALPHA-SULFONYL HYDROXAMIC ACID DERIVATIVES American Cyanamid Company (US) 2002-10-30 EP disclosed
US-20020099035-A1 Method for preparing alpha-sulfonyl hydroxamic acid derivatives WYETH HOLDINGS CORPORATION 2002-07-25 US disclosed
US-6337176-B1 COLOR REPRODUCTION AND SHARPNESS; RAPID PROCESSING FUJI PHOTO FILM CO., LTD. (JP) 2002-01-08 US disclosed
WO-2001055112-A1 METHOD FOR PREPARING ALPHA-SULFONYL HYDROXAMIC ACID DERIVATIVES AMERICAN CYANAMID COMPANY (US) 2001-08-02 WO disclosed
US-6013426-A SILVER HALIDE EMULSIONS WITH COLLOID LAYER WITH BLACK COLLOIDAL SILVER ON A SUPPORT FUJI PHOTO FILM CO., LTD. (JP) 2000-01-11 US disclosed
US-5728514-A Silver halide color photographic material and method for forming color image FUJI PHOTO FILM CO, LTD. (JP) 1998-03-17 US disclosed
EP-0679634-B1 Method for producing a 3-oxo-propionic acid amide compound and substituted acetyl compound used therein FUJI PHOTO FILM CO LTD (JP) 1998-01-07 EP disclosed
EP-0679634-A2 Method for producing a 3-oxo-propionic acid amide compound and substituted acetyl compound used therein FUJI PHOTO FILM CO., LTD. (JP) 1995-11-02 EP disclosed
EP-0375040-A2 Process for the preparation of retro-inverso peptides and new intermediates thereof SCLAVO S.p.A. (IT) 1990-06-27 EP disclosed