SCHEMBL265547

SCHEMBL265547

CCC1(C)CC(=O)C(C)C(C)(CC)N1

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.35
LMNA P02545 1/20 0.35
CYP2C19 P33261 1/20 0.35
TSHR P16473 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
MAPT P10636 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11533628 0.76 KDM4E (0.32) KDM4ELMNACYP2C19TSHRNPSR1
SCHEMBL11459912 0.75 KDM4E (0.37) KDM4ELMNACYP2C19TSHRNPSR1
SCHEMBL3383357 0.74 ALDH1A1 (0.32)
SCHEMBL3383359 0.74 ALDH1A1 (0.32)
SCHEMBL9202272 0.69 LMNA (0.44) KDM4ELMNACYP2C19TSHRNPSR1
SCHEMBL4352181 0.68
SCHEMBL4803750 0.64 KDM4E (0.40) KDM4ELMNACYP2C19TSHRNPSR1
SCHEMBL3992295 0.63
SCHEMBL18901077 0.63
SCHEMBL266564 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 148 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8134009-B2 Process for the oxidation of secondary amines into the corresponding nitroxides BASF SE (DE) 2012-03-13 US claimed
JP-11322714-A None JP disclosed
US-8916621-B2 Photoresist compositions BASF SE (DE) 2014-12-23 US disclosed
US-8916621-B2 Photoresist compositions BASF SE (DE) 2014-12-23 US disclosed
EP-1606259-B1 PROCESS FOR THE OXIDATION OF SECONDARY AMINES INTO THE CORRESPONDING NITROXIDES BASF SE (DE) 2014-06-25 EP disclosed
US-20130302728-A1 PHOTORESIST COMPOSITIONS BASF SE (DE) 2013-11-14 US disclosed
US-20130302728-A1 PHOTORESIST COMPOSITIONS BASF SE (DE) 2013-11-14 US disclosed
US-8507569-B2 Photoresist compositions BASF SE (DE) 2013-08-13 US disclosed
US-8507569-B2 Photoresist compositions BASF SE (DE) 2013-08-13 US disclosed
US-8134009-B2 Process for the oxidation of secondary amines into the corresponding nitroxides BASF SE (DE) 2012-03-13 US disclosed
US-4203890-A Hindered piperidine carboxylic acids, metal salts thereof and stabilized compositions CIBA-GEIGY CORPORATION (US) 1980-05-20 US disclosed
US-4191682-A Hindered piperidine carboxylic acids, metal salts thereof and stabilized compositions CIBA-GEIGY CORPORATION (US) 1980-03-04 US disclosed
US-4191683-A Derivatives of 4-aminopiperidine as stabilizers for polymers CIBA-GEIGY CORPORATION (US) 1980-03-04 US disclosed
US-4141883-A Stabilization of synthetic polymers by penta-or-hexa-substituted 4-piperidinol derivatives SANKYO COMPANY, LIMITED (JP) 1979-02-27 US disclosed
US-4131599-A ULTRAVIOLET DEGRADATION SANKYO COMPANY, LIMITED (JP) 1978-12-26 US disclosed
US-4116933-A Hindered piperidine carboxylic acids, metal salts thereof and stabilized compositions CIBA-GEIGY CORPORATION (US) 1978-09-26 US disclosed
US-4105626-A DERIVATIVES OF 4-OXOPIPERIDINES AND THEIR USE AS POLYMER STABILIZERS CIBA-GEIGY CORPORATION (US) 1978-08-08 US disclosed
US-4101509-A Hindered piperidine carboxylic acids, metal salts thereof and stabilized compositions CIBA-GEIGY CORPORATION (US) 1978-07-18 US disclosed
US-4097587-A 1,3,8-Triazaspiro 4.5!decane-2,4-dione polymer stabilizers SANKYO COMPANY, LIMITED (JA) 1978-06-27 US disclosed
US-4075165-A 2,2,6,6-TETRA-SUBSTITUTED-4-PIPERIDINOL CIBA-GEIGY CORPORATION (US) 1978-02-21 US disclosed